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1. (WO2001034530) GERMANIUM SILICON OXYNITRIDE HIGH INDEX FILMS FOR PLANAR WAVEGUIDES
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2001/034530 International Application No.: PCT/US2000/028022
Publication Date: 17.05.2001 International Filing Date: 10.10.2000
Chapter 2 Demand Filed: 03.05.2001
IPC:
C01B 21/082 (2006.01) ,C03B 19/14 (2006.01) ,C03B 32/00 (2006.01) ,C03C 3/04 (2006.01) ,C03C 3/11 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
21
Nitrogen; Compounds thereof
082
Compounds containing nitrogen and non-metals
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
B
MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
19
Other methods of shaping glass
14
by gas-phase reaction processes
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
B
MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
32
Thermal after-treatment of glass products not provided for in groups C03B25/-C03B31/121
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3
Glass compositions
04
containing silica
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3
Glass compositions
04
containing silica
076
with 40% to 90% silica by weight
11
containing halogen or nitrogen
Applicants:
CORNING INCORPORATED [US/US]; 1 Riverfront Plaza Corning, NY 14831, US
Inventors:
AKWANI, Ikerionwu, A.; US
BELLMAN, Robert, A.; US
GRANDI, Thomas, P.; US
SACHENIK, Paul, A.; US
Agent:
ALDEN, Philip, G.; Corning Incorporated SP TI 3 1 Corning, NY 14831, US
Priority Data:
09/437,67710.11.1999US
Title (EN) GERMANIUM SILICON OXYNITRIDE HIGH INDEX FILMS FOR PLANAR WAVEGUIDES
(FR) FILMS A INDICE ELEVE D'OXYNITRURE DE SILICIUM-GERMANIUM DESTINES A DES GUIDES D'ONDES PLATS
Abstract:
(EN) A composition represented by the formula Si1-xGexO2(1-y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5 x 10-6°C-1 to about 5.0 x 10-6°C-1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
(FR) L'invention concerne une composition représentée par la formule Si1-xGexO2(1-y)N1.33y, dans laquelle x vaut entre environ 0,05 et environ 0,6 et y vaut entre environ 0,14 et environ 0,74. Cette composition présente des propriétés qui conviennent particulièrement à la fabrication de guides d'ondes pour des dispositifs optiques à cristaux liquides. D'une manière spécifique, ces compositions présentent un indice de réfraction compris entre environ 1,6 et environ 1,8 pour de la lumière à une longueur d'ondes de 1550 nm et/ou un coefficient d'expansion thermique compris entre environ 2,5 x 10-6°C-1 et environ 5,0 x 10-6°C-1. Ces compositions présentent également un faible taux d'hydrogène inhérent et une forte perméabilité à l'hydrogène, ce qui permet d'obtenir une meilleure élimination de l'hydrogène par recuit thermique afin de produire un matériau qui présente peu de pertes optiques et de meilleures propriétés d'attaque par rapport à d'autres matériaux.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)