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1. (WO2001031680) VACUUM CIRCUIT FOR A DEVICE FOR TREATING A RECEPTACLE WITH LOW PRESSURE PLASMA

Pub. No.:    WO/2001/031680    International Application No.:    PCT/FR2000/002941
Publication Date: Fri May 04 01:59:59 CEST 2001 International Filing Date: Tue Oct 24 01:59:59 CEST 2000
IPC: C23C 16/04
C23C 16/50
H01J 37/32
Applicants: SIDEL ACTIS SERVICES
Inventors: RIUS, Jean-Michel
Title: VACUUM CIRCUIT FOR A DEVICE FOR TREATING A RECEPTACLE WITH LOW PRESSURE PLASMA
Abstract:
The invention relates to a device for treating a receptacle (30) with a low pressure plasma, comprising at least one treatment station (14) consisting of a fixed cavity (32) which is connected by a vacuum circuit (74) to a depressurizing source, and wherein said treatment station (14) consists of a moveable cover (34) provided with means for supporting (54) the receptacle (30) in such a way that the receptacle in introduced into the cavity (32) by displacing the cover (34). The invention is characterized in that the cover (34) comprises a connecting channel (64) which enables the cavity (32) to communicate with a fixed end (69) of the vacuum circuit when the cover (34) is in a position in which the cavity is hermetically sealed.