Search International and National Patent Collections

1. (WO2001030928) CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND SYSTEMS

Pub. No.:    WO/2001/030928    International Application No.:    PCT/US2000/030260
Publication Date: Fri May 04 01:59:59 CEST 2001 International Filing Date: Tue Oct 31 00:59:59 CET 2000
IPC: C09G 1/02
Applicants: CABOT MICROELECTRONICS CORPORATION
Inventors: WANG, Shumin
LINDZY, Lisa, M.
Title: CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND SYSTEMS
Abstract:
A polishing composition comprising cyanuric containing additive. Also disclosed, is a CMP system comprising an abrasive, an oxidizing agent, at least one cyanuric containing additive, and optionally a complexing agent, film forming agent and dispersing agent.