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Machine translation
1. (WO2001030928) CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND SYSTEMS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/030928    International Application No.:    PCT/US2000/030260
Publication Date: 03.05.2001 International Filing Date: 30.10.2000
Chapter 2 Demand Filed:    25.05.2001    
IPC:
C09G 1/02 (2006.01)
Applicants: CABOT MICROELECTRONICS CORPORATION [US/US]; 870 Commons Drive, Aurora, IL 60504 (US)
Inventors: WANG, Shumin; (US).
LINDZY, Lisa, M.; (US)
Agent: TURNER-BRIM, Phyllis, T.; Cabot Microelectronics Corporation, 870 North Commons Drive, Aurora, IL 60504 (US)
Priority Data:
09/429,188 28.10.1999 US
Title (EN) CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND SYSTEMS
(FR) COMPOSITIONS ET SYSTEMES DE POLISSAGE CHIMIOMECANIQUE
Abstract: front page image
(EN)A polishing composition comprising cyanuric containing additive. Also disclosed, is a CMP system comprising an abrasive, an oxidizing agent, at least one cyanuric containing additive, and optionally a complexing agent, film forming agent and dispersing agent.
(FR)L'invention concerne une composition de polissage renfermant un additif à base de cyanure. Elle concerne également un système de polissage chimiomécanique comprenant un abrasif, un agent oxydant, au moins un additif à base de cyanure et, éventuellement, des agents complexant, filmogène et dispersant.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)