Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2001027695) REMOVABLE COVER FOR PROTECTING A RETICLE, SYSTEM INCLUDING AND METHOD OF USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2001/027695 International Application No.: PCT/US2000/041056
Publication Date: 19.04.2001 International Filing Date: 04.10.2000
Chapter 2 Demand Filed: 07.05.2001
IPC:
G03F 1/62 (2012.01) ,G03F 1/66 (2012.01) ,G03F 7/20 (2006.01) ,H01L 21/027 (2006.01) ,H01L 21/673 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62
Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
66
Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
673
using specially adapted carriers
Applicants:
SILICON VALLEY GROUP, INC. [US/US]; Suite 400 101 Metro Drive San Jose, CA 95110, US
Inventors:
CATEY, Eric, B.; US
HULT, David; US
DEL PUERTO, Santiago; US
ROUX, Stephen; US
Agent:
RAY, Michael, B. ; Sterne, Kessler, Goldstein & Fox P.L.L.C. Suite 600 1100 New York Avenue Washington, DC 20005-3934, US
Priority Data:
09/473,71029.12.1999US
60/158,14208.10.1999US
Title (EN) REMOVABLE COVER FOR PROTECTING A RETICLE, SYSTEM INCLUDING AND METHOD OF USING THE SAME
(FR) COUVERCLE AMOVIBLE DESTINE A PROTEGER UN RETICULE, SYSTEME COMPRENANT CE COUVERCLE ET PROCEDE D'UTILISATION ASSOCIE
Abstract:
(EN) A removable cover for protecting a reticle used in a lithography system is described. The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspected with the removable cover in place. This removable cover protects the reticle when the removable cover is in place and is removable for lithographic exposure. The removable cover can further include at least one reticle fastener that applies force to the reticle thereby preventing movement of the removable cover relative to the reticle when the removable cover is in place. A plurality of fasteners are used to position and secure the removable cover and reticle. A method of performing lithography and a lithographic system are also described.
(FR) L'invention concerne un couvercle amovible destiné à protéger un réticule utilisé dans un système lithographique. Ce couvercle amovible comprend un cadre ainsi qu'une membrane supportée par ce cadre. Ladite membrane est transparente pour une longueur d'onde d'inspection, d'où la possibilité d'inspecter le réticule même si le couvercle amovible est en place. Lorsqu'il est en place, ledit couvercle amovible protège le réticule, mais peut s'enlever pour l'exécution d'une opération lithographique. Ce couvercle amovible peut également comprendre au moins une attache de réticule appliquant une force au réticule lorsque ledit couvercle amovible est en place. Une pluralité d'attaches sont utilisées pour placer et fixer le couvercle amovible et le réticule. L'invention concerne également un procédé consistant à effectuer une lithographie, ainsi qu'un système lithographique.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)