WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2001026164) CONTROL OF OXIDE LAYER REACTION RATES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/026164    International Application No.:    PCT/US2000/040388
Publication Date: 12.04.2001 International Filing Date: 14.07.2000
Chapter 2 Demand Filed:    22.02.2001    
IPC:
C30B 23/02 (2006.01), H01L 39/14 (2006.01), H01L 39/24 (2006.01)
Applicants: AMERICAN SUPERCONDUCTOR CORPORATION [US/US]; Two Technology Drive, Westborough, MA 01581-1727 (US)
Inventors: ZHANG, Wei; (US).
LI, Qi; (US).
RUPICH, Martin, W.; (US)
Agent: HEIBEL, George, E.; Fish & Richardson P.C., Suite 2800, 45 Rockefeller Center, New York, NY 10111 (US)
Priority Data:
60/145,468 23.07.1999 US
60/166,297 18.11.1999 US
60/166,140 18.11.1999 US
60/166,145 18.11.1999 US
09/500,701 09.02.2000 US
09/500,717 09.02.2000 US
09/500,718 09.02.2000 US
Title (EN) CONTROL OF OXIDE LAYER REACTION RATES
(FR) COMMANDE DES VITESSES DE REACTION DE COUCHES D'OXYDE
Abstract: front page image
(EN)A process is described for formation of oxide films independent of thickness from precursor films comprising metals, metal oxides, and metal fluorides with properties and structures similar to those previously only obtained in thin films, for example less than about 0.4 microns.
(FR)La présente invention concerne un procédé permettant la formation de couches d'oxyde de toutes épaisseurs, à partir de couches précurseurs qui comprennent des métaux, des oxydes métalliques et des fluorures métalliques et qui présentent des propriétés et des structures similaires à celles précédemment obtenues uniquement dans des couches minces, par exemple inférieures à environ 0,4 microns.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)