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1. (WO2001025500) METHOD AND DEVICE FOR PRODUCTION OF PLANE-PARALLEL WAFERS

Pub. No.:    WO/2001/025500    International Application No.:    PCT/DE2000/002419
Publication Date: Apr 12, 2001 International Filing Date: Jul 25, 2000
IPC: C09C 1/00
C09C 1/64
C09C 3/04
C23C 14/00
Applicants: WEINERT, Jasmin
Inventors: WEINERT, Jasmin
Title: METHOD AND DEVICE FOR PRODUCTION OF PLANE-PARALLEL WAFERS
Abstract:
The invention relates to a device for the production of plane-parallel wafers which comprises a support which is rotatable about one axis, an arrangement for coating a flat surface area of the support with at least one layer of product, an arrangement for detaching the product layer from said flat surface area of the support in such a manner as to create plane-parallel wafers. Transport of said flat surface area between said coating arrangement and said detaching arrangement is achieved by rotation of the support. The arrangement for coating the support can also have a layer of release agent applied before the layer of product, said release agent being dissolved in the detaching arrangement to release the plane-parallel wafers.