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1. (WO2001005727) LOW DENSITY WELL CEMENT COMPOSITIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/005727    International Application No.:    PCT/US2000/040369
Publication Date: 25.01.2001 International Filing Date: 12.07.2000
Chapter 2 Demand Filed:    05.02.2001    
IPC:
C04B 22/00 (2006.01), C04B 24/38 (2006.01), C04B 28/02 (2006.01), C09K 8/46 (2006.01)
Applicants: PHILLIPS PETROLEUM COMPANY [US/US]; 4th and Keeler, Bartlesville, OK 74004 (US) (For All Designated States Except US).
STEPHENS, Michael [US/US]; (US) (For US Only).
PEREIRA, Burton [US/US]; (US) (For US Only)
Inventors: STEPHENS, Michael; (US).
PEREIRA, Burton; (US)
Agent: RICHARDS, John; Ladas & Parry, 26 West 61st Street, New York, NY 10023 (US)
Priority Data:
09/353,841 15.07.1999 US
Title (EN) LOW DENSITY WELL CEMENT COMPOSITIONS
(FR) COMPOSITIONS DE CIMENT DE FAIBLE DENSITE POUR PUITS
Abstract: front page image
(EN)Improved low density well cement slurry compositions are formed by the addition of a free-fluid inhibitor additive to a mixture comprising a hydraulic cement and water. Suitable free-fluid inhibitors are hydroxy ethyl cellulose polymers having a cps value in the range of from about 5000 to about 50,000.
(FR)L'invention concerne des compositions améliorées de suspension épaisse de ciment pour puits, qu'on obtient par addition d'un additif inhibant les fluides libres sur un mélange contenant un ciment hydraulique et de l'eau. Des inhibiteurs de fluides libres appropriés sont par exemple des polymères d'hydroxyéthylcellulose présentant une valeur cps se situant entre environ 5000 et environ 50000.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)