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1. (WO2001005702) AN ACIDIC OZONE SOLUTION HAVING A HIGH OZONE CONTENT, A METHOD FOR PREPARING THE SOLUTION, AND A CLEANING METHOD USING THE SOLUTION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2001/005702 International Application No.: PCT/US2000/019444
Publication Date: 25.01.2001 International Filing Date: 17.07.2000
Chapter 2 Demand Filed: 18.12.2000
IPC:
C01B 13/10 (2006.01) ,C11D 7/02 (2006.01) ,C11D 7/08 (2006.01) ,C11D 7/26 (2006.01) ,C11D 11/00 (2006.01) ,H01L 21/306 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
13
Oxygen; Ozone; Oxides or hydroxides in general
10
Preparation of ozone
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
7
Compositions of detergents based essentially on non-surface-active compounds
02
Inorganic compounds
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
7
Compositions of detergents based essentially on non-surface-active compounds
02
Inorganic compounds
04
Water-soluble compounds
08
Acids
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
7
Compositions of detergents based essentially on non-surface-active compounds
22
Organic compounds
26
containing oxygen
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
11
Special methods for preparing compositions containing mixtures of detergents
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
306
Chemical or electrical treatment, e.g. electrolytic etching
Applicants:
SHIMIZU, Katunori [JP/JP]; US (UsOnly)
IWAMOTO, Yosio [JP/JP]; US (UsOnly)
MEMC ELECTRONIC MATERIALS, INC. [US/US]; 501 Pearl Drive P.O. Box 8, Mail Zone MZ 33 St. Peters, MO 63376, US (AllExceptUS)
Inventors:
SHIMIZU, Katunori; US
IWAMOTO, Yosio; US
Agent:
HEJLEK, Edward, J. ; Senniger, Powers, Leavitt & Roedel 16th floor One Metropolitan Square St. Louis, MO 63102, US
Priority Data:
11/20374116.07.1999JP
Title (EN) AN ACIDIC OZONE SOLUTION HAVING A HIGH OZONE CONTENT, A METHOD FOR PREPARING THE SOLUTION, AND A CLEANING METHOD USING THE SOLUTION
(FR) SOLUTION ACIDE D'OZONE A TENEUR ELEVEE EN OZONE, PROCEDE DE PREPARATION DE CETTE SOLUTION ET TECHNIQUE DE NETTOYAGE A L'AIDE DE CETTE SOLUTION
Abstract:
(EN) The present invention relates to an acidic ozone solution having a high concentration of ozone, a method for preparing the solution by injecting ozone into an acid, and a method for cleaning single crystal silicon wafers using the solution.
(FR) Cette invention a trait à une solution acide d'ozone à teneur élevée en ozone, à un procédé de préparation de cette solution par injection d'ozone dans de l'acide et à une technique de nettoyage de tranches de silicium monocristallin à l'aide de cette solution.
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Designated States: CN, JP, KR, SG, US
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)