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1. (WO2001004569) METHOD AND SYSTEM FOR PROFILING OBJECTS
PCT Biblio. Data
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Pub. No.:
WO/2001/004569
International Application No.:
PCT/US2000/018761
Publication Date:
18.01.2001
International Filing Date:
07.07.2000
Chapter 2 Demand Filed:
09.02.2001
IPC:
G01B 11/24
(2006.01),
G01B 11/30
(2006.01)
G
PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
24
for measuring contours or curvatures
G
PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
30
for measuring roughness or irregularity of surfaces
Applicants:
ZYGO CORPORATION
[US/US]; 21 Laurel Brook Road, Middlefield, CT 06455-0448 (US)
(For All Designated States Except US)
.
DE GROOT, Peter
[US/US]; (US)
(For US Only)
Inventors:
DE GROOT, Peter
; (US)
Agent:
PRAHL, Eric, L.
; Fish & Richardson P.C., 225 Franklin Street, Boston, MA 02110-2804 (US)
Priority Data:
09/349,593
09.07.1999
US
Title
(EN)
METHOD AND SYSTEM FOR PROFILING OBJECTS
(FR)
PROCEDE ET SYSTEME PERMETTANT DE PROFILER DES OBJETS
Abstract:
(EN)
The invention features methods and systems for interferometrically profiling a measurement object (40) having multiple reflective surfaces (44, 46), e.g., to profile a selected one of the multiple reflective surfaces. The methods and systems involve: positioning the measurement object within an unequal path length interferometer (20) (e.g., a Fizeau Interferometer) employing a tunable coherent light source (22); recording an optical interference image (32) for each of multiple wavelengths of the light source, each image including a superposition of multiple interference patterns produced by pairs of wavefronts reflected from the multiple surfaces of the measurement object and a reference surface; and extracting phases of a selected one of the interference patterns from the recorded images by using a phase-shifting algorithm that is more sensitive (e.g., at least ten times more sensitive) to a wavelength-dependent variation in the recorded images caused by the selected interference pattern than to wavelength-dependent variations in the recorded images caused by the other interference patterns.
(FR)
La présente invention concerne des procédés et des systèmes permettant de profiler un objet de mesure (40) par réflectométrie, ledit objet ayant plusieurs surfaces de réflexion (44, 46), par exemple, afin de profiler une surface sélectionnée parmi ces surfaces de réflexion. Ces procédés et systèmes consistent à positionner l'objet de mesure dans un interféromètre à longueur de trajectoire inégale (20) (un interféromètre de Fizeau, par exemple) qui utilise une source de lumière cohérente accordable (22), à enregistrer une image d'interférence optique (32) pour chacune des multiples longueurs d'onde de la source de lumière, chaque image comprenant une superposition de modèles d'interférence multiples, produits par des paires de fronts d'onde, réfléchies sur les surfaces de l'objet de mesure et sur une surface de référence, puis à extraire des phases d'un modèle sélectionné parmi les modèles d'interférence, à partir des images enregistrées, par utilisation d'un algorithme de décalage de phase, qui est plus sensible (au moins dix fois plus sensible, par exemple) à une variation dans les images enregistrées, dépendante de la longueur d'onde et causée par le modèle d'interférence sélectionné, qu'aux variations dans les images enregistrées, dépendantes de la longueur d'onde et causées par les autres modèles d'interférence.
Designated States:
JP, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language:
English (
EN
)
Filing Language:
English (
EN
)