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Machine translation
1. (WO2001003742) DRUG COMPOSITION FOR TOPICAL ADMINISTRATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/003742    International Application No.:    PCT/JP2000/004651
Publication Date: 18.01.2001 International Filing Date: 12.07.2000
IPC:
A61K 47/14 (2006.01), A61K 47/34 (2006.01), A61K 47/38 (2006.01)
Applicants: SUNTORY LIMITED [JP/JP]; 1-40, Dojimahama 2-chome, Kita-ku, Osaka-shi, Osaka 530-8203 (JP) (For All Designated States Except US).
SATO PHARMACEUTICAL CO., LTD. [JP/JP]; 5-27, Moto-akasaka 1-chome, Minato-ku, Tokyo 107-0051 (JP) (For All Designated States Except US).
TATARA, Mitsutoshi [JP/JP]; (JP) (For US Only).
SHIMIZU, Toshihito [JP/JP]; (JP) (For US Only).
FUKUMOTO, Ryoichi [JP/JP]; (JP) (For US Only).
NOMURA, Masaaki [JP/JP]; (JP) (For US Only)
Inventors: TATARA, Mitsutoshi; (JP).
SHIMIZU, Toshihito; (JP).
FUKUMOTO, Ryoichi; (JP).
NOMURA, Masaaki; (JP)
Agent: SHAMOTO, Ichio; Yuasa and Hara, Section 206, New Ohtemachi Bldg., 2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo 100-0004 (JP)
Priority Data:
11/198012 12.07.1999 JP
Title (EN) DRUG COMPOSITION FOR TOPICAL ADMINISTRATION
(FR) COMPOSITION DE MEDICAMENT POUR ADMINISTRATION TOPIQUE
Abstract: front page image
(EN)A drug composition for topical administration which can stay in the region of application for a long period and permits the release of the active ingredient at a controlled rate. This composition comprises as the essential components an active ingredient, a water-insoluble polymer, a water-compatible solvent in which the polymer is soluble, and, if necessary, other additives.
(FR)Cette invention se rapporte à une composition de médicament pour administration topique, qui peut demeurer dans la zone d'application pendant une longue période et permet la libération du principe actif à un débit régulé. Cette composition comprend comme constituants essentiels un principe actif, un polymère insoluble dans l'eau, un solvant hydrocompatible, dans lequel le polymère est soluble, et, si nécessaire, d'autres additifs.
Designated States: CN, JP, KR, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)