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1. (WO2001003162) LOW-PRESSURE APPARATUS AND PRESSURE CONTROL VALVE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2001/003162 International Application No.: PCT/EP2000/006040
Publication Date: 11.01.2001 International Filing Date: 28.06.2000
IPC:
F16K 3/34 (2006.01) ,F16K 51/02 (2006.01) ,H01L 21/00 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
3
Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
30
Details
34
Arrangements for modifying the way in which the rate of flow varies during the actuation of the valve
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
51
Other details not peculiar to particular types of valves or cut-off apparatus
02
specially adapted for high-vacuum installations
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applicants: KONINKLIJKE PHILIPS ELECTRONICS N.V.[NL/NL]; Groenewoudseweg 1 NL-5621 BA Eindhoven, NL
Inventors: VAN DE KERKHOF, Antonius, M., C., P., L.; NL
Agent: DUIJVESTIJN, Adrianus, J.; Internationaal Octrooibureau B.V. Prof. Holstlaan 6 NL-5656 AA Eindhoven, NL
Priority Data:
99202115.430.06.1999EP
Title (EN) LOW-PRESSURE APPARATUS AND PRESSURE CONTROL VALVE
(FR) APPAREIL BASSE PRESSION ET SOUPAPE DE REGULATION DE PRESSION
Abstract:
(EN) A pressure control valve (9) for adjusting a valve opening in a wafer processing system, which pressure control valve (9) is provided on the exhaust pipe (6), the pressure control valve (9) comprising a flow channel (10), a first flow-through element (12), which first flow-through element (11) and second flow-through element (12) are arranged behind each other in the flow channel (10) in the direction (13) of the gas flow and border respectively a first flow-through opening and a second flow-through opening, at least one of the first flow-through element (11) and the second flow-through element (12) being movable substantially transversely to the direction (13) of the gas flow in order to establish a desired overlap between the first flow-through opening and the second flow-through opening and create a common opening referred to as the valve opening, the first flow-through opening at least being provided with a first opening portion bordered by two first edges, which mutually taper into a pointed end, whereby the movable flow-through element at least is ajdustable in a position in which the valve opening exclusively comprises only the pointed end of the first opening portion.
(FR) L'invention concerne une soupape (9) de régulation de pression destinée à régler une ouverture de soupape dans un système de traitement de plaquettes, la soupape (9) de régulation de pression étant située sur le tuyau (6) d'échappement. La soupape (9) de régulation de pression comprend un canal (10) d'écoulement et un premier (11) élément de circulation continue, ce premier (11) élément de circulation continue et un deuxième (12) élément de circulation continue étant disposés l'un derrière l'autre dans le canal (10) d'écoulement dans la direction du flux de gaz et limitant respectivement une première ouverture de circulation continue et une deuxième ouverture de circulation continue. Au moins l'un ou l'autre du premier (11) élément de circulation continue et du deuxième (12) élément de circulation continue est amovible sensiblement transversalement par rapport au sens (13) d'écoulement du gaz, ce qui permet d'établir un chevauchement voulu entre la première ouverture de circulation continue et la deuxième ouverture de circulation continue et de créer une ouverture commune dénommée ouverture de soupape. La première ouverture de circulation continue comporte au moins un premier segment d'ouverture limité par deux premiers bords décroissant mutuellement en une extrémité pointue, l'élément de circulation continue amovible étant au moins réglable dans une position dans laquelle l'ouverture de soupape comprend exclusivement l'extrémité pointue du premier segment d'ouverture.
front page image
Designated States: JP, KR
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)