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1. (WO2001002380) ANTIPSYCHOTIC CYCLIC N-ARALKYL AMINES
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2001/002380 International Application No.: PCT/FR2000/001790
Publication Date: 11.01.2001 International Filing Date: 27.06.2000
Chapter 2 Demand Filed: 29.01.2001
IPC:
C07D 295/03 (2006.01) ,C07D 295/073 (2006.01) ,C07D 295/096 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
295
Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
02
containing only hydrogen and carbon atoms in addition to the ring hetero elements
027
containing only one hetero ring
03
with the ring nitrogen atoms directly attached to acyclic carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
295
Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
04
with substituted hydrocarbon radicals attached to ring nitrogen atoms
06
substituted by halogen atoms or nitro radicals
073
with the ring nitrogen atoms and the substituents separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
295
Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
04
with substituted hydrocarbon radicals attached to ring nitrogen atoms
08
substituted by singly bound oxygen or sulfur atoms
096
with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
Applicants:
BOIGEGRAIN, Robert [FR/FR]; FR (UsOnly)
BOURRIE, Martine [FR/FR]; FR (UsOnly)
LAIR, Pierre [FR/FR]; FR (UsOnly)
PAUL, Raymond [FR/FR]; FR (UsOnly)
PONCELET, Martine [FR/FR]; FR (UsOnly)
VERNIERES, Jean-Claude [FR/FR]; FR (UsOnly)
SANOFI-SYNTHELABO [FR/FR]; 174, avenue de France F-75013 Paris, FR (AllExceptUS)
Inventors:
BOIGEGRAIN, Robert; FR
BOURRIE, Martine; FR
LAIR, Pierre; FR
PAUL, Raymond; FR
PONCELET, Martine; FR
VERNIERES, Jean-Claude; FR
Agent:
THOURET-LEMAITRE, Elisabeth; Sanofi-Synthelabo 174, avenue de France F-75013 Paris, FR
Priority Data:
99/0853202.07.1999FR
Title (EN) ANTIPSYCHOTIC CYCLIC N-ARALKYL AMINES
(FR) N-ARALKYL AMINES CYCLIQUES ANTIPSYCHOTIQUES
Abstract:
(EN) The invention concerns antipsychotic compounds of formula (I) wherein: A represents a group selected among the following: -C$m(Z)C-; -CH=CH-; -CH2-CH2-; n is equal to 1 or 2; X represents a hydrogen, chlorine or fluorine atom, a methyl or methoxy group; Y represents a hydrogen atom or a chlorine or a fluorine atom; R1 represents a cyclohexyl, phenyl, cycloheptyl, tertiary butyl, dicyclopropylmethyl, bicyclo[3.2.1]octanyl, 4-tetrahydropyranyl, 4-tetrahydrothiopyranyl or adamantyle group; R2 and R3 form together with the nitrogen atom whereto they re bound a cyclic amine; and the additive salts of said compounds with pharmaceutically acceptable acids, as well as their solvates and hydrates.
(FR) Composès antipsychotiques de formule (I) dans laquelle: A représente un groupe choisi parmi les suivants: -C≡C-; -CH=CH-, -CH2-CH2-; n est égal à 1 ou 2; X représente un atome d'hydrogène, de chlore ou de fluor ou un groupe méthyle ou méthoxy; Y représente un atome d'hydrogène ou un atome de chlore ou de fluor; R1 représente un groupe cyclohexyle phényle cycloheptyle, tert-butyle, dicyclopropylméthyle, bicyclo[3.2.1]octanyle, 4-tétrahydropyranyle, 4-tétrahydrothiopyranyle ou adamantyle; R2 et R3 forment avec l'atome d'azote auquel ils sont liés une amine cyclique et les sels d'addition de ces composés avec des acides pharmaceutiquement acceptables, ainsi que leurs solvats et hydrates.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)