Search International and National Patent Collections

1. (WO2001001472) METHOD AND APPARATUS FOR FORMING A FILM ON A SUBSTRATE

Pub. No.:    WO/2001/001472    International Application No.:    PCT/GB2000/002301
Publication Date: Fri Jan 05 00:59:59 CET 2001 International Filing Date: Tue Jun 27 01:59:59 CEST 2000
IPC: C23C 16/40
C23C 16/56
H01L 21/3105
H01L 21/311
H01L 21/316
Applicants: TRIKON HOLDINGS LIMITED
GILES, Katherine
BEEKMANN, Knut
DOBSON, Christopher, David
MACNEIL, John
WILBY, Antony, Paul
Inventors: GILES, Katherine
BEEKMANN, Knut
DOBSON, Christopher, David
MACNEIL, John
WILBY, Antony, Paul
Title: METHOD AND APPARATUS FOR FORMING A FILM ON A SUBSTRATE
Abstract:
This invention relates to a method and apparatus for forming a film on the substrate. The method comprises supplying to the chamber in gaseous or vapour form a silicon containing organic compound and an oxidising agent in the presence of a plasma to deposit a film on the substrate and setting the film such that carbon containing groups are retained therein. In particular embodiments the setting is achieved by exposing the film to H2 plasma.