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1. (WO2001000745) COMPOSITION FOR POLISHING SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING SUBSTRATE FOR MAGNETIC DISK

Pub. No.:    WO/2001/000745    International Application No.:    PCT/JP2000/004245
Publication Date: Fri Jan 05 00:59:59 CET 2001 International Filing Date: Thu Jun 29 01:59:59 CEST 2000
IPC: C09G 1/02
C09K 3/14
Applicants: SHOWA DENKO K.K.

MIYATA, Norihiko

Inventors: MIYATA, Norihiko

Title: COMPOSITION FOR POLISHING SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING SUBSTRATE FOR MAGNETIC DISK
Abstract:
A composition for polishing a substrate for a magnetic disk, which comprises water, fine titanium oxide particles and a polishing promoter, characterized in that 90 to 100 % of the titanium oxide constituting said particles has the same crystal structure; and a method for producing a substrate for a magnetic disk using the composition. The composition can be used for polishing a substrate for a magnetic disk, at an economical polishing rate, so as to have a reduced surface roughness and to become free from the occurrence of fine defects such as projections, scraches by abrasion and micropits.