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Machine translation
1. (WO2001000745) COMPOSITION FOR POLISHING SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING SUBSTRATE FOR MAGNETIC DISK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/000745    International Application No.:    PCT/JP2000/004245
Publication Date: 04.01.2001 International Filing Date: 28.06.2000
IPC:
C09G 1/02 (2006.01), C09K 3/14 (2006.01)
Applicants: SHOWA DENKO K.K. [JP/JP]; 13-9, Shibadaimon 1-chome, Minato-ku, Tokyo 105-8518 (JP) (For All Designated States Except US).
MIYATA, Norihiko [JP/JP]; (JP) (For US Only)
Inventors: MIYATA, Norihiko; (JP)
Agent: SHIGA, Masatake; OR Building, 23-3, Takadanobaba 3-chome, Shinjuku-ku, Tokyo 169-8925 (JP)
Priority Data:
11/181753 28.06.1999 JP
Title (EN) COMPOSITION FOR POLISHING SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING SUBSTRATE FOR MAGNETIC DISK
(FR) COMPOSITION POUR LE POLISSAGE D'UN SUBSTRAT DE DISQUE MAGNETIQUE ET PROCEDE DE FABRICATION DE CE SUBSTRAT
Abstract: front page image
(EN)A composition for polishing a substrate for a magnetic disk, which comprises water, fine titanium oxide particles and a polishing promoter, characterized in that 90 to 100 % of the titanium oxide constituting said particles has the same crystal structure; and a method for producing a substrate for a magnetic disk using the composition. The composition can be used for polishing a substrate for a magnetic disk, at an economical polishing rate, so as to have a reduced surface roughness and to become free from the occurrence of fine defects such as projections, scraches by abrasion and micropits.
(FR)L'invention porte sur une composition destinée au polissage d'un substrat de disque magnétique. Cette composition comprend de l'eau, de fines particules d'oxyde de titane et un promoteur de polissage, et se caractérise en ce que les 90 à 100 % d'oxyde de titane constituant ces particules ont la même structure cristalline. L'invention porte également sur un procédé de fabrication d'un substrat de disque magnétique utilisant la composition. La composition peut être utilisée pour polir le substrat du disque magnétique, à une vitesse de polissage économique, de sorte que la rugosité de surface soit réduite et qu'il n'y ait pas de formation de défauts tels que éléments saillants, rayures par abrasion et creux.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)