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1. (WO2001000744) ABRASIVE COMPOUND FOR GLASS HARD DISK PLATTER

Pub. No.:    WO/2001/000744    International Application No.:    PCT/JP2000/004172
Publication Date: Fri Jan 05 00:59:59 CET 2001 International Filing Date: Tue Jun 27 01:59:59 CEST 2000
IPC: C03C 19/00
C09K 3/14
Applicants: NISSAN CHEMICAL INDUSTRIES, LTD.

OTA, Isao

NISHIMURA, Tohru

TANIMOTO, Kenji

Inventors: OTA, Isao

NISHIMURA, Tohru

TANIMOTO, Kenji

Title: ABRASIVE COMPOUND FOR GLASS HARD DISK PLATTER
Abstract:
An abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 νm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, cerium accounts for 95 % or more in terms of oxides of the total amount of rare earth elements in the abrasive. The abrasive compound is suitable for polishing the surface of a glass substrate for an optical disk platter and a magnetic disk platter.