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1. (WO2001000744) ABRASIVE COMPOUND FOR GLASS HARD DISK PLATTER
PCT Biblio. Data
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National Phase
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Documents
Latest bibliographic data on file with the International Bureau
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Pub. No.:
WO/2001/000744
International Application No.:
PCT/JP2000/004172
Publication Date:
04.01.2001
International Filing Date:
26.06.2000
Chapter 2 Demand Filed:
08.12.2000
IPC:
C03C 19/00
(2006.01) ,
C09K 3/14
(2006.01)
C
CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
19
Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
C
CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
14
Anti-slip materials; Abrasives
Applicants:
OTA, Isao
[JP/JP]; JP (UsOnly)
NISHIMURA, Tohru
[JP/JP]; JP (UsOnly)
TANIMOTO, Kenji
[JP/JP]; JP (UsOnly)
NISSAN CHEMICAL INDUSTRIES, LTD.
[JP/JP]; 7-1, Kandanishiki-cho 3-chome Chiyoda-ku, Tokyo 101-0054, JP (AllExceptUS)
Inventors:
OTA, Isao
; JP
NISHIMURA, Tohru
; JP
TANIMOTO, Kenji
; JP
Agent:
HANABUSA, Tsuneo
; Hanabusa Patent Office Ochanomizu Square B 6, Kandasurugadai 1-chome Chiyoda-ku Tokyo 101-0062, JP
Priority Data:
11/181449
28.06.1999
JP
Title
(EN)
ABRASIVE COMPOUND FOR GLASS HARD DISK PLATTER
(FR)
COMPOSE ABRASIF POUR PLATEAU EN VERRE DE DISQUE DUR
Abstract:
(EN)
An abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 $g(m)m and containing CeO
2
in a concentration of 0.2 to 30 wt %. Preferably, cerium accounts for 95 % or more in terms of oxides of the total amount of rare earth elements in the abrasive. The abrasive compound is suitable for polishing the surface of a glass substrate for an optical disk platter and a magnetic disk platter.
(FR)
Cette invention concerne un composé abrasif pour plateau en verre de disque dur. Ce composé se caractérise en ce qu'il comprend une pâte épaisse stable renfermant de l'eau et, à l'état de dispersion pour l'abrasif, des particules d'oxyde de cérium (IV) d'une granulométrie secondaire moyenne comprise entre 0,1 et 0,5 $g(m)m, et contenant du CeO
2
en concentration de 0,2 à 20 % en poids. Le cérium représente de préférence 95 % minimum en termes d'oxydes du volume total des éléments de terres rares présents dans l'abrasif. Le composé abrasif selon l'invention convient pour le polissage en surface d'un substrat en verre pour plateau de disque optique ou pour plateau de disque magnétique.
Designated States:
US
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language:
Japanese (
JA
)
Filing Language:
Japanese (
JA
)