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1. (WO2001000710) PHOTOSENSITIVE LOW-PERMITTIVITY POLYIMIDE AND METHOD OF FORMING POSITIVE POLYIMIDE FILM PATTERN FROM THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2001/000710    International Application No.:    PCT/JP2000/004173
Publication Date: 04.01.2001 International Filing Date: 26.06.2000
Chapter 2 Demand Filed:    19.01.2001    
IPC:
C08G 73/10 (2006.01), G03F 7/004 (2006.01), G03F 7/023 (2006.01), G03F 7/039 (2006.01), H05K 1/00 (2006.01)
Applicants: PI R & D CO., LTD. [JP/JP]; 12-5, Torihamacho, Kanazawa-ku, Yokohama-shi, Kanagawa 236-0002 (JP) (For All Designated States Except US).
ITATANI, Hiroshi [JP/JP]; (JP) (For US Only).
MATSUMOTO, Shunichi [JP/JP]; (JP) (For US Only)
Inventors: ITATANI, Hiroshi; (JP).
MATSUMOTO, Shunichi; (JP)
Agent: TANIGAWA, Hidejiro; Tanigawa And Associates, Patent Firm, Iwata Building 6F, 5-12, Iidabashi 4-chome, Chiyoda-ku, Tokyo 102-0072 (JP)
Priority Data:
11/217678 25.06.1999 JP
Title (EN) PHOTOSENSITIVE LOW-PERMITTIVITY POLYIMIDE AND METHOD OF FORMING POSITIVE POLYIMIDE FILM PATTERN FROM THE SAME
(FR) POLYIMIDE PHOTOSENSIBLE A FAIBLE PERMITTIVITE ET OBTENTION D'UN MOTIF POUR FILM DE POLYIMIDE POSITIF OBTENU A PARTIR DUDIT POLYIMIDE
Abstract: front page image
(EN)A photosensitive low-permittivity polyimide for use in applications where a low permittivity is required, such as interlayer dielectrics in semiconductor devices. The polyimide is a solvent-soluble polyimide which has positive photosensitivity in the presence of a photo-acid generator. It is obtained by the polycondensation of at least one aromatic tetracarboxylic dianhydride and at least one mainly aromatic diamine, wherein at least either of the at least one aromatic tetracarboxylic dianhydride and the at least one diamine as components of the polyimide contains a fluorine atom and/or the diamine comprises benzidine or a derivative thereof and/or a fluorene derivative. It has a specific permittivity of 2.90 or lower.
(FR)Cette invention concerne un polyimide photosensible à faible permittivité destiné à des applications nécessitant une faible permittivité, telles que des intercouches diélectriques dans des dispositifs semi-conducteurs. Ce polyimide est un polyimide soluble dans l'eau qui présente une photo-sensibilité positive en présence d'un générateur photo-acide. Il s'obtient par polycondensation d'au moins un dianhydre tétracarboxylique aromatique et d'au moins un diamine principalement aromatique. En tant que composante du polyimide, soit un moins un dianhydre tétracarboxylique aromatique, soit au moins un diamine principalement aromatique renferme un atome de fluor et/ou la diamine comprend de la benzidine ou un dérivé de la benzidine et/ou un dérivé de fluorène. Ce polyimide a une permittivité spécifique de 2,90 ou moins.
Designated States: JP, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)