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Machine translation
1. (WO2000062671) APPARATUS FOR MEASURING RELATIVE HYDRATION OF A SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/062671    International Application No.:    PCT/US2000/010811
Publication Date: 26.10.2000 International Filing Date: 20.04.2000
Chapter 2 Demand Filed:    16.11.2000    
IPC:
A61B 5/053 (2006.01), A61B 5/103 (2006.01)
Applicants: NOVA TECHNOLOGY CORPORATION [US/US]; 9 Post Road, Portsmouth, NH 03801-5422 (US)
Inventors: CAMPBELL, Michael, J., E.; (US).
GALLANT, Michael, L.; (US).
GIGUERE, Dennis, D.; (US).
HORGAN, Thomas, B.; (US).
NICKSON. Steven, W.; (US).
SHEPPE, Richard, W., Jr.; (US)
Agent: HERBSTER, George, A.; Pearson & Pearson, 10 George Street, Lowell, MA 01852 (US)
Priority Data:
60/130,080 20.04.1999 US
Title (EN) APPARATUS FOR MEASURING RELATIVE HYDRATION OF A SUBSTRATE
(FR) APPAREIL DE MESURE DE L'HYDRATATION RELATIVE D'UN SUBSTRAT
Abstract: front page image
(EN)Measurements of the electrical characteristics of the substrate and the force applied to and the temperature of the substrate during the measurement provide inputs for determining the relative hydration of the substrate.
(FR)On effectue des mesures des caractéristiques électriques du substrat et la force exercée sur le substrat et la température du substrat durant la prise des mesures qui fournissent des données permettant de déterminer l'hydratation relative du substrat.
Designated States: AE, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CR, CU, CZ, DE, DK, DM, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)