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Machine translation
1. (WO2000062311) MAGNETIC MATERIALS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/062311    International Application No.:    PCT/GB2000/001306
Publication Date: 19.10.2000 International Filing Date: 07.04.2000
Chapter 2 Demand Filed:    27.10.2000    
IPC:
C22C 19/03 (2006.01), B82B 1/00 (2006.01), G01R 33/00 (2006.01), G01R 33/02 (2006.01), G06N 99/00 (2010.01), G11B 5/64 (2006.01), G11B 5/65 (2006.01), G11C 11/16 (2006.01), H01F 1/00 (2006.01), H01F 1/147 (2006.01), H01F 10/14 (2006.01), H01F 10/32 (2006.01), H03K 19/168 (2006.01), G11B 5/74 (2006.01), G11B 5/82 (2006.01)
Applicants: CAMBRIDGE UNIVERSITY TECHNICAL SERVICES LIMITED [GB/GB]; The Old Schools, Trinity Lane, Cambridge CB2 1TS (GB) (For All Designated States Except US).
COWBURN, Russell [GB/GB]; (GB) (For US Only).
WELLAND, Mark [GB/GB]; (GB) (For US Only)
Inventors: COWBURN, Russell; (GB).
WELLAND, Mark; (GB)
Agent: GILL JENNINGS & EVERY; Broadgate House, 7 Eldon Street, London EC2M 7LH (GB)
Priority Data:
9908179.6 09.04.1999 GB
Title (EN) MAGNETIC MATERIALS
(FR) MATERIAUX MAGNETIQUES
Abstract: front page image
(EN)A memory element comprising nanomagnets having a rotational symmetry selected in order to provide high remanence and a suitable coercivity. There is also a sensor element comprising nanomagnets having a rotational symmetry selected such that they are superparamagnetic and exhibit substantially zero hysteresis so that a magnetisation of the nanomagnets depends only on the current value of applied field and not on the field history.
(FR)La présente invention concerne un élément de mémoire comprenant des nano-aimants comportant une symétrie de rotation choisie en vue de fournir une rémanence élevée et une force coercitive appropriée. Il est aussi prévu un élément capteur comprenant des nano-aimants présentant une symétrie de rotation choisie pour qu'ils soient superparamagnétiques et présentent sensiblement une hystérésis nulle de sorte qu'une magnétisation des nano-aimants ne dépende que de la valeur courante du champs appliqué et non de l'historique du champ.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CR, CU, CZ, DE, DK, DM, DZ, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)