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Machine translation
1. (WO2000059013) EXPOSURE APPARATUS, SEMICONDUCTOR DEVICE, AND PHOTOMASK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/059013    International Application No.:    PCT/JP2000/001868
Publication Date: 05.10.2000 International Filing Date: 27.03.2000
IPC:
H01L 21/027 (2006.01), C03B 20/00 (2006.01), C03C 3/06 (2006.01), G03F 1/60 (2012.01), G03F 7/20 (2006.01)
Applicants: ASAHI GLASS COMPANY, LIMITED [JP/JP]; 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 100-8405 (JP) (For All Designated States Except US).
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. [JP/JP]; 292, Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa 244-0817 (JP) (For All Designated States Except US).
OGAWA, Tohru [JP/JP]; (JP) (For US Only).
HOSONO, Hideo [JP/JP]; (JP) (For US Only).
KIKUGAWA, Shinya [JP/JP]; (JP) (For US Only).
IKUTA, Yoshiaki [JP/JP]; (JP) (For US Only).
MASUI, Akio [JP/JP]; (JP) (For US Only).
SHIMODAIRA, Noriaki [JP/JP]; (JP) (For US Only).
YOSHIZAWA, Shuhei [JP/JP]; (JP) (For US Only)
Inventors: OGAWA, Tohru; (JP).
HOSONO, Hideo; (JP).
KIKUGAWA, Shinya; (JP).
IKUTA, Yoshiaki; (JP).
MASUI, Akio; (JP).
SHIMODAIRA, Noriaki; (JP).
YOSHIZAWA, Shuhei; (JP)
Agent: SENMYO, Kenji; Torimoto Kogyo Building, 38, Kanda-Higashimatsushitacho, Chiyoda-ku, Tokyo 101-0042 (JP)
Priority Data:
11/82067 25.03.1999 JP
Title (EN) EXPOSURE APPARATUS, SEMICONDUCTOR DEVICE, AND PHOTOMASK
(FR) APPAREIL D'EXPOSITION, DISPOSITIF A SEMI-CONDUCTEUR ET MASQUE PHOTOGRAPHIQUE
Abstract: front page image
(EN)An exposure apparatus including synthesis quartz glass for optical members, in which at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask, and a projection optical system has an absorption coefficient of 0.70 cm ?-1¿ or less at a wavelength of 157 nm and an infrared absorption peak at about 3640 cm?-1¿ attributed to SiOH stretching vibration.
(FR)L'invention porte sur un appareil d'exposition comprenant un verre de silice de synthèse pour des éléments optiques et dans lequel au moins un des éléments optiques constitue un système de source lumineuse d'exposition ; un système optique d'éclairage ; un masque photographique et un système optique de projection ayant un coefficient d'absorption égal ou inférieur à 0,70 cm?-1¿ à une longueur d'onde de 157 nm et une pointe d'absorption infrarouge à environ 3640 cm?-1¿ attribuée à une vibration d'élongation de SiOH.
Designated States: KR, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)