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Machine translation
1. (WO2000058231) SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER, PROCESS FOR PRODUCING THE SAME, AND METHOD OF USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/058231    International Application No.:    PCT/JP2000/001869
Publication Date: 05.10.2000 International Filing Date: 27.03.2000
IPC:
B08B 7/00 (2006.01), C03B 19/14 (2006.01), C03C 3/06 (2006.01), C03C 23/00 (2006.01)
Applicants: ASAHI GLASS COMPANY, LIMITED [JP/JP]; 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 100-8405 (JP) (For All Designated States Except US).
KIKUGAWA, Shinya [JP/JP]; (JP) (For US Only).
IKUTA, Yoshiaki [JP/JP]; (JP) (For US Only).
MASUI, Akio [JP/JP]; (JP) (For US Only).
SHIMODAIRA, Noriaki [JP/JP]; (JP) (For US Only).
YOSHIZAWA, Shuhei [JP/JP]; (JP) (For US Only)
Inventors: KIKUGAWA, Shinya; (JP).
IKUTA, Yoshiaki; (JP).
MASUI, Akio; (JP).
SHIMODAIRA, Noriaki; (JP).
YOSHIZAWA, Shuhei; (JP)
Agent: SENMYO, Kenji; Torimoto Kogyo Bldg., 38, Kanda-Higashimatsushitacho, Chiyoda-ku, Tokyo 101-0042 (JP)
Priority Data:
11/82262 25.03.1999 JP
Title (EN) SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER, PROCESS FOR PRODUCING THE SAME, AND METHOD OF USING THE SAME
(FR) VERRE DE SILICE SYNTHETIQUE POUR ELEMENT OPTIQUE, SON PROCEDE DE FABRICATION ET D'UTILISATION
Abstract: front page image
(EN)A process for producing a synthetic quartz glass for optical members, which comprises the step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths not longer than 165 nm.
(FR)L'invention porte sur un procédé de fabrication d'un verre de silice synthétique qui consiste à irradier un verre de silice synthétique possédant un groupe OH d'une teneur inférieure ou égale à 50 ppm avec des ultraviolets à vide dont la longueur d'onde est inférieure ou égale à 180 nm en vue d'améliorer la transmittance dans une région de longueurs d'ondes inférieures à 165 nm.
Designated States: KR, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)