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1. WO2000044036 - USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS

Publication Number WO/2000/044036
Publication Date 27.07.2000
International Application No. PCT/US2000/001626
International Filing Date 26.01.2000
Chapter 2 Demand Filed 25.08.2000
IPC
C09C 1/36 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES; PREPARATION OF CARBON BLACK
1Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
36Compounds of titanium
H01L 21/3105 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
3105After-treatment
H01L 21/316 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
314Inorganic layers
316composed of oxides or glassy oxides or oxide-based glass
CPC
C01P 2002/82
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
2002Crystal-structural characteristics
80defined by measured data other than those specified in group C01P2002/70
82by IR- or Raman-data
C01P 2006/16
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
2006Physical properties of inorganic compounds
16Pore diameter
C09C 1/3081
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES
1Treatment of specific inorganic materials other than fibrous fillers
28Compounds of silicon
30Silicic acid
3081Treatment with organo-silicon compounds
C09C 1/3684
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES
1Treatment of specific inorganic materials other than fibrous fillers
36Compounds of titanium
3607Titanium dioxide
3684Treatment with organo-silicon compounds
G06F 3/023
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
FELECTRIC DIGITAL DATA PROCESSING
3Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01Input arrangements or combined input and output arrangements for interaction between user and computer
02Input arrangements using manually operated switches, e.g. using keyboards or dials
023Arrangements for converting discrete items of information into a coded form, e.g. arrangements for interpreting keyboard generated codes as alphanumeric codes, operand codes or instruction codes
G06F 3/0237
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
FELECTRIC DIGITAL DATA PROCESSING
3Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01Input arrangements or combined input and output arrangements for interaction between user and computer
02Input arrangements using manually operated switches, e.g. using keyboards or dials
023Arrangements for converting discrete items of information into a coded form, e.g. arrangements for interpreting keyboard generated codes as alphanumeric codes, operand codes or instruction codes
0233Character input methods
0237using prediction or retrieval techniques
Applicants
  • ALLIEDSIGNAL INC. [US/US]; 101 Columbia Road P.O. Box 2245 Morristown, NJ 07962-2245, US
Inventors
  • WU, Hui-Jung; US
  • DRAGE, James, S.; US
Agents
  • CRISS, Roger, H. ; AlliedSignal Inc. (Law Dept., Attn: A. Olinger) 101 Columbia Road P.O. Box 2245 Morristown, NJ 07962-2245, US
Priority Data
60/117,24826.01.1999US
null19.01.2000US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS
(FR) UTILISATION D'OLIGOMERE/POLYMERE MULTIFONCTIONNEL A BASE DE SI POUR MODIFIER LA SURFACE DE FILMS DE DIOXYDE DE SILICIUM NANOPOREUX
Abstract
(EN)
A process for treating a silica film on a substrate, which includes reacting a suitable silica film with an effective amount of a surface modification agent, wherein the silica film is present on a substrate. The reaction is conducted under suitable conditions and for a period of time sufficient for the surface modification agent to form a hydrophobic coating on the film. The surface modification agent includes at least one type of oligomer or polymer reactive with silanols on the silica film. Dielectric films and integrated circuits including such films are also disclosed.
(FR)
L'invention concerne un procédé de traitement d'un film de dioxyde de silicium sur un substrat, qui comporte l'étape consistant à faire réagir un film de dioxyde de silicium approprié avec une quantité efficace d'un agent de modification de surface, le film de dioxyde de silicium étant présent sur un substrat. La réaction est mise en oeuvre dans des conditions appropriées et pendant une durée suffisante pour que l'agent de modification de surface forme un revêtement hydrophobe sur le film. L'agent de modification de surface comporte au moins un type d'oligomère ou de polymère réagissant avec des silanols sur le film de dioxyde de silicium. Des films diélectriques et des circuits intégrés comportant de tels films sont également décrits.
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