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1. WO2000043838 - LASER WRITER

Publication Number WO/2000/043838
Publication Date 27.07.2000
International Application No. PCT/SE2000/000136
International Filing Date 21.01.2000
Chapter 2 Demand Filed 14.07.2000
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70383
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Applicants
  • MICRONIC LASER SYSTEMS AB [SE/SE]; Box 3141 S-183 93 Täby, SE (AllExceptUS)
  • SANDSTRÖM, Torbjörn [SE/SE]; SE (UsOnly)
  • ODSELIUS, Leif [SE/SE]; SE (UsOnly)
  • THUREN, Anders [SE/SE]; SE (UsOnly)
  • GULLSTRAND, Stefan [SE/SE]; SE (UsOnly)
Inventors
  • SANDSTRÖM, Torbjörn; SE
  • ODSELIUS, Leif; SE
  • THUREN, Anders; SE
  • GULLSTRAND, Stefan; SE
Agents
  • AWAPATENT AB; Box 11394 S-404 28 Göteborg, SE
Priority Data
9900170-321.01.1999SE
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) LASER WRITER
(FR) ECRITURE LASER
Abstract
(EN)
The present invention relates to a system and a method for microlithographic writing on photosensitive substrates, and specially printing of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. More specific, the method according to the invention comprises the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter the support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the position where the writing was interrupted when the error condition has ceased to exist.
(FR)
L'invention concerne un système et un procédé d'écriture microlithographique sur substrats photosensibles, qui permettent notamment d'imprimer avec une très grande précision des motifs tels que masques photographiques pour motifs de dispositifs à semi-conducteurs, panneaux d'affichage, dispositifs optiques intégrés et structures d'interconnexion électroniques. Le procédé comprend les étapes suivantes: détection d'une condition d'erreur d'écriture temporaire importante et interruption de l'opération d'écriture en réponse à la détection de ladite condition; retour de la table support à la position qu'elle avait au moment où l'écriture a été interrompue; et reprise de l'opération d'écriture à l'emplacement où elle a été interrompue une fois que la condition d'erreur a cessé d'exister.
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