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1. WO2000042642 - CIRCUIT BOARD PRODUCTION METHOD AND ITS APPARATUS

Publication Number WO/2000/042642
Publication Date 20.07.2000
International Application No. PCT/JP1999/007342
International Filing Date 27.12.1999
Chapter 2 Demand Filed 07.02.2000
IPC
G01N 15/02 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
15Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
02Investigating particle size or size distribution
CPC
G01N 15/0211
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
15Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
02Investigating particle size or size distribution
0205by optical means, e.g. by light scattering, diffraction, holography or imaging
0211Investigating a scatter or diffraction pattern
G01N 15/0227
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
15Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
02Investigating particle size or size distribution
0205by optical means, e.g. by light scattering, diffraction, holography or imaging
0227using imaging, e.g. a projected image of suspension; using holography
G01N 2015/0216
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
15Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
02Investigating particle size or size distribution
0205by optical means, e.g. by light scattering, diffraction, holography or imaging
0211Investigating a scatter or diffraction pattern
0216from fluctuations of diffraction pattern
Applicants
  • HITACHI, LTD. [JP/JP]; 6, Kanda Surugadai 4-chome Chiyoda-ku Tokyo 101-8010, JP (AllExceptUS)
  • NAKANO, Hiroyuki [JP/JP]; JP (UsOnly)
  • NAKATA, Toshihiko [JP/JP]; JP (UsOnly)
  • SERIZAWA, Masayoshi [JP/JP]; JP (UsOnly)
  • SASAZAWA, Hideaki [JP/JP]; JP (UsOnly)
Inventors
  • NAKANO, Hiroyuki; JP
  • NAKATA, Toshihiko; JP
  • SERIZAWA, Masayoshi; JP
  • SASAZAWA, Hideaki; JP
Agents
  • SAKUTA, Yasuo; Hitachi, Ltd. 5-1, Marunouchi 1-chome Chiyoda-ku Tokyo 100-8220, JP
Priority Data
11/428811.01.1999JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) CIRCUIT BOARD PRODUCTION METHOD AND ITS APPARATUS
(FR) PROCEDE ET DISPOSITIF DE PRODUCTION D'UNE PLAQUETTE DE CIRCUIT
Abstract
(EN)
Foreign matters floating in a processing chamber are detected by means of an optical system comprising an observation window and a unit. To detect weak foreign-matter scattering light with high accuracy, a P-polarized beam of light whose strength is modulated with a frequency different from the frequency of an exciting source and from its harmonics is projected into the processing chamber through the observation window inclined at the Brewster's angle with respect to the P-polarized input beam while an object in the processing chamber is being subjected to desired thin-film formation and processing. Backscattering light scattering at the foreign matters in the processing chamber is received through the same observation window by a detection optical system to form an image. The frequency component in the received signal and the waveform component of the beam whose strength is modulated are detected. By using the detected components and the formed image information, the number, size, and distribution of foreign matters are measured.
(FR)
Selon l'invention, on détecte des matières étrangères flottant dans une chambre de traitement à l'aide d'un système optique comprenant une fenêtre d'observation ainsi qu'une unité. Afin de détecter une faible lumière de diffusion de matières étrangères avec une très grande précision, le procédé consiste à projeter un faisceau à polarisation P de lumière dont on module la force à l'aide d'une fréquence qui est différente de celle d'une source d'excitation et des harmoniques de celle-ci, dans la chambre de traitement, à travers la fenêtre d'observation inclinée de manière à former un angle de Brewster avec le faisceau d'entrée à polarisation P, tandis que, dans la chambre de traitement, on soumet un objet à la formation et au traitement recherchés d'une couche mince, à recevoir la lumière de rétrodiffusion diffusant au niveau des matières étrangères, dans la chambre de traitement, à travers la même fenêtre d'observation, à l'aide d'un système optique de détection destiné à former une image, puis à détecter la composante de fréquence du signal reçu et la composante de forme d'onde du faisceau dont la force est modulée, et enfin à utiliser les composantes détectées et les informations relatives à l'image formée, pour mesurer le nombre, la dimension et la répartition des matières étrangères.
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