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1. WO2000042475 - CHEMICAL FILTERING FOR OPTIMISING THE LIGHT TRANSMITTANCE OF A GAS

Publication Number WO/2000/042475
Publication Date 20.07.2000
International Application No. PCT/US2000/000214
International Filing Date 05.01.2000
Chapter 2 Demand Filed 18.07.2000
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70058
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
G03F 7/70866
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70866of mask or workpiece
G03F 7/70883
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70883of optical system
Y10S 438/909
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
438Semiconductor device manufacturing: process
909Controlled atmosphere
Applicants
  • DONALDSON COMPANY, INC. [US/US]; 1400 West 94th Street P.O. Box 1299 Minneapolis, MN 55440-1299, US
Inventors
  • DALLAS, Andrew, J.; US
Agents
  • BRUESS, Steven, C.; Merchant & Gould P.C. 3100 Norwest Center 90 South Seventh Street Minneapolis, MN 55402-4131, US
Priority Data
09/231,73715.01.1999US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) CHEMICAL FILTERING FOR OPTIMISING THE LIGHT TRANSMITTANCE OF A GAS
(FR) FILTRATION CHIMIQUE PERMETTANT D'OPTIMISER LE FACTEUR DE TRANSMISSION DE LA LUMIERE D'UN GAZ
Abstract
(EN)
Systems and methods of achieving optimal light transmittance through a gas (16) and light transmittance region. This invention is directed at the application of specific activated carbon based materials for the protection of imaging lenses (12) which are targeting optimal transmittance at specific wavelengths. Specifically, it outlines a use of a use of a specific type of carbon to obtain improved/constant transmittance at a specific waverlength or range of wavelengths. In addition, it also presents the use of a mixture of activated carbon types in order to obtain improved/constant transmissions over a broad range of wavelengths.
(FR)
Cette invention a trait à des dispositifs et à des procédés permettant d'obtenir un facteur optimal de transmission de la lumière d'un gaz (16) et une région de transmittance lumineuse optimale. Elle porte sur l'utilisation de matériaux à base de carbone activé spécifique et ce, pour protéger des lentilles d'imagerie (12) ciblant une transmittance optimale à des longueurs d'onde spécifique. Elle concerne, notamment, l'emploi d'un type de carbone spécifique visant à obtenir une transmittance améliorée et/ou constante, à une longueur d'onde spécifique ou dans une gamme donnée de longueurs d'onde. Elle a trait, de surcroît, à l'utilisation d'un mélange d'un certain nombre de types de carbone activé permettant d'obtenir des facteurs de transmission améliorés et/ou constants dans une gamme importante de longueurs d'onde.
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