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1. WO2000041974 - COMPOSITION AND METHOD FOR SIMULTANEOUSLY PRECIPITATING METAL IONS FROM SEMICONDUCTOR WASTEWATER AND ENHANCING MICROFILTER OPERATION

Publication Number WO/2000/041974
Publication Date 20.07.2000
International Application No. PCT/US1999/028477
International Filing Date 02.12.1999
Chapter 2 Demand Filed 02.08.2000
IPC
C02F 1/56 2006.01
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
52by flocculation or precipitation of suspended impurities
54using organic material
56Macromolecular compounds
CPC
C02F 1/56
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
52by flocculation or precipitation of suspended impurities
54using organic material
56Macromolecular compounds
C02F 2101/20
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
2101Nature of the contaminant
10Inorganic compounds
20Heavy metals or heavy metal compounds
C02F 2103/346
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
2103Nature of the water, waste water, sewage or sludge to be treated
34from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
346from semiconductor processing, e.g. waste water from polishing of wafers
Y10S 210/912
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
210Liquid purification or separation
902Materials removed
911Cumulative poison
912Heavy metal
Applicants
  • NALCO CHEMICAL COMPANY [US/US]; One Nalco Center Naperville, IL 60563-1198, US
Inventors
  • SALMEN, Kristine, S.; US
  • KOWALSKI, Angela, S.; US
  • ZEIHER, E., H., Kelle; US
  • WARD, William, J.; US
Agents
  • KEEFER, Timothy, J. ; Wildman, Harrold, Allen & Dixon 225 West Wacker Drive Chicago, IL 60606-1229, US
Priority Data
09/232,48515.01.1999US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) COMPOSITION AND METHOD FOR SIMULTANEOUSLY PRECIPITATING METAL IONS FROM SEMICONDUCTOR WASTEWATER AND ENHANCING MICROFILTER OPERATION
(FR) COMPOSITION ET PROCEDE PERMETTANT DE PRECIPITER LES IONS METALLIQUES DES EAUX RESIDUAIRES ISSUES DU TRAITEMENT DES SEMI-CONDUCTEURS TOUT EN AMELIORANT LE FONCTIONNEMENT D'UN MICROFILTRE
Abstract
(EN)
The simultaneous precipitation of soluble heavy metal ions from semiconductor wastewater containing abrasive solids and enhancement of microfilter operation is achieved through the addition of an effective amount of a water-soluble polymer containing dithiocarbamate functionalities to the wastewater.
(FR)
La présente invention concerne la précipitation d'ions métalliques lourds solubles des eaux résiduaires issues du traitement des semi-conducteurs contenant des solides abrasifs et, simultanément, l'amélioration du fonctionnement d'un microfiltre. A cet effet on ajoute aux eaux résiduaires une quantité efficace d'un polymère hydrosoluble comportant les fonctionnalités du dithiocarbamate.
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