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1. WO2000040632 - CURABLE RESIN COMPOSITION, MODIFIED COPOLYMER AND RESIN COMPOSITION, AND ALKALI DEVELOPMENT TYPE PHOTOCURABLE GLASS PASTE

Publication Number WO/2000/040632
Publication Date 13.07.2000
International Application No. PCT/JP1999/007249
International Filing Date 24.12.1999
IPC
C08F 8/14 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8Chemical modification by after-treatment
14Esterification
C08F 265/00 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/181
C08F 265/04 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/181
04on to polymers of esters
C08F 285/00 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
285Macromolecular compounds obtained by polymerising monomers on to preformed graft polymers
C08F 290/12 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
08on to polymers modified by introduction of unsaturated side groups
12Polymers provided for in subclasses C08C or C08F76
C08L 51/00 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
51Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
CPC
C08F 265/00
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
C08F 265/04
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
04on to polymers of esters
C08F 2810/20
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2810Chemical modification of a polymer
20leading to a crosslinking, either explicitly or inherently
C08F 2810/30
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2810Chemical modification of a polymer
30leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
C08F 285/00
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
285Macromolecular compounds obtained by polymerising monomers on to preformed graft polymers
C08F 290/12
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
08on to polymers modified by introduction of unsaturated side groups
12Polymers provided for in subclasses C08C or C08F
Applicants
  • DAICEL CHEMICAL INDUSTRIES, LTD. [JP/JP]; 1, Teppo-cho Sakai-shi, Osaka 590-0905, JP (AllExceptUS)
  • MIYAKE, Hiroto [JP/JP]; JP (UsOnly)
  • MARUO, Katsuya [JP/JP]; JP (UsOnly)
Inventors
  • MIYAKE, Hiroto; JP
  • MARUO, Katsuya; JP
Agents
  • MIURA, Yoshikazu; Kurosusaido Kojimachi 4, Kojimachi 5-chome Chiyoda-ku Tokyo 102-0083, JP
Priority Data
10/37207528.12.1998JP
11/12948411.05.1999JP
11/6009908.03.1999JP
11/9738805.04.1999JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) CURABLE RESIN COMPOSITION, MODIFIED COPOLYMER AND RESIN COMPOSITION, AND ALKALI DEVELOPMENT TYPE PHOTOCURABLE GLASS PASTE
(FR) COMPOSITION DE RESINE DURCISSABLE, COPOLYMERE MODIFIE ET COMPOSITION DE RESINE, ET PATE DE VERRE PHOTODURCISSABLE POUR DEVELOPPEMENT DE TYPE ALCALIN
Abstract
(EN)
A curable resin composition which comprises a modified copolymer obtained by incorporating an epoxidized unsaturated compound through addition into part of the acid groups of a copolymer obtained mainly from acrylic acid and a (meth)acrylic ester, and is excellent in resist film forming properties and ink sensitivity; a photocurable or thermosetting resin and a composition thereof which each comprises a modification of a specific copolymer having a Tg of 50°C or higher, and has satisfactory ink sensitivity and tack-free properties; a curable resin composition for resists which is obtained from a copolymer of $g(b)-carboxyethyl acrylate by epoxy-modifying the copolymer and either adding a functional acrylate monomer, e.g., acryloylmorpholine, to the copolymer after the epoxy modification or copolymerizing the functional monomer with the copolymer before the epoxy modification, is satisfactory in necessary properties, sensitivity, and resolution, and has improved plating resistance; and an alkali development type photocurable glass paste composition which comprises a curable resin, a photopolymerization initiator, a photopolymerizable monomer, a diluting solvent, and a glass frit and is capable of stably forming a highly fine and precise bulkhead pattern on the substrate of a large plasma display panel while keeping the working atmosphere, product yield, and production efficiency satisfactory.
(FR)
Une composition de résine durcissable qui comprend un copolymère modifié obtenu par incorporation d'un composé insaturé époxydé par addition dans une partie de l'acide de groupes d'un copolymère obtenu essentiellement à partir d'un acide acrylique et d'un ester (méth)acrylique, et présente d'excellentes qualités de formation du film de résiste et de sensibilité à l'encre. Une résine photodurcissable ou thermodurcissable et une composition des mêmes comportant chacune une modification d'un copolymère spécifique d'une Tg d'au moins 50°C, et présentant une bonne sensibilité à l'encre et de bonnes propriétés anti-adhérentes. Une composition de résine durcissable pour résistes, qui est obtenue à partir d'un copolymère de $g(b)-carboxyéthyle-acrylate par modification époxy du copolymère, et soit adjonction d'un monomère acrylate fonctionnel tel qu'une acryloylmorpholine, au copolymère après la modification époxy, soit copolymérisation du monomère fonctionnel avec le copolymère avant la modification époxy, présente de bonnes propriétés indispensables, une bonne sensibilité et une bonne résolution. Elle fait preuve en outre d'une résistance accrue au placage. Et enfin une composition de pâte de verre photodurcissable pour développement de type alcalin comprenant une résine durcissable, un initiateur de photopolymérisation, un monomère photopolymérisable, un solvant de dilution, et de la fritte de verre, et est capable de former de façon stable un motif de bloc de distribution très fin et précis sur le substrat d'un grand écran plat à plasma tout en conservant à un niveau satisfaisant l'atmosphère de travail, la qualité du produit et le rendement de production.
Also published as
US09623079
Latest bibliographic data on file with the International Bureau