Processing

Please wait...

PATENTSCOPE will be unavailable a few hours for maintenance reason on Sunday 05.04.2020 at 10:00 AM CEST
Settings

Settings

1. WO2000039838 - METHOD FOR IGNITING A PLASMA INSIDE A PLASMA PROCESSING REACTOR

Publication Number WO/2000/039838
Publication Date 06.07.2000
International Application No. PCT/US1999/031076
International Filing Date 28.12.1999
Chapter 2 Demand Filed 26.07.2000
IPC
H01J 37/32 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
CPC
H01J 37/32009
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
H01J 37/321
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
321the radio frequency energy being inductively coupled to the plasma
H01J 37/3266
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
3266Magnetic control means
Applicants
  • LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway Fremont, CA 94538-6470, US
Inventors
  • WICKER, Thomas; US
  • COOK, Joel; US
  • CHEN, Jian; US
Agents
  • NGUYEN, Joseph, A.; Beyer & Weaver LLP Post Office Box 61059 Palo Alto, CA 94306, US
Priority Data
09/223,69230.12.1998US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR IGNITING A PLASMA INSIDE A PLASMA PROCESSING REACTOR
(FR) PROCEDE D'AMORÇAGE DE PLASMA DANS UN REACTEUR DE TRAITEMENT AU PLASMA
Abstract
(EN)
The invention relates to a plasma processing reactor for processing a substrate. The plasma processing reactor includes a process chamber. The plasma processing reactor further includes an inductive coil configured to be coupled to a RF power source having a RF frequency wherein the inductive coil generates an electric field inside of the process chamber. The plasma processing reactor additionally includes a magnetic field producing device configured to produce a magnetic field inside the process chamber in proximity of the electric field.
(FR)
L'invention concerne un réacteur de traitement au plasma destiné au traitement d'un substrat. Le réacteur de traitement au plasma comprend une chambre de traitement. Le réacteur de traitement au plasma comprend également un bobine d'induction configurée de manière à être couplée à une source d'énergie haute fréquence dotée d'une fréquence HF, la bobine inductive générant un champ électrique à l'intérieur de la chambre de traitement. Le réacteur de traitement au plasma comprend en outre un dispositif de production de champ magnétique configuré de manière à produire un champ magnétique à l'intérieur de la chambre de traitement à proximité du champ électrique.
Latest bibliographic data on file with the International Bureau