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1. WO2000039623 - REFLECTION REFRACTION IMAGE-FORMING OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS COMPRISING THE OPTICAL SYSTEM

Publication Number WO/2000/039623
Publication Date 06.07.2000
International Application No. PCT/JP1999/007225
International Filing Date 22.12.1999
IPC
G02B 17/08 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 17/0808
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0804using two curved mirrors
0808on-axis systems with at least one of the mirrors having a central aperture
G02B 17/0812
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0804using two curved mirrors
0812off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
G02B 17/0856
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0856comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
G02B 17/0892
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0892specially adapted for the UV
G02B 3/04
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3Simple or compound lenses
02with non-spherical faces
04with continuous faces that are rotationally symmetrical but deviate from a true sphere ; , e.g. so called "aspheric" lenses
G03F 7/70225
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70225Catadioptric systems, i.e. documents describing optical design aspect details
Applicants
  • NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome Chiyoda-ku Tokyo 100-0005, JP (AllExceptUS)
  • OMURA, Yasuhiro [JP/JP]; JP (UsOnly)
Inventors
  • OMURA, Yasuhiro; JP
Agents
  • INOUE, Yoshio ; 3F Garoh Building 1-4, Nihonbashi 3-chome Chuo-ku Tokyo 103-0027, JP
Priority Data
10/37014325.12.1998JP
11/6676912.03.1999JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) REFLECTION REFRACTION IMAGE-FORMING OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS COMPRISING THE OPTICAL SYSTEM
(FR) SYSTEME OPTIQUE DE FORMATION D'IMAGE PAR REFLEXION REFRACTION ET APPAREIL D'EXPOSITION PAR PROJECTION COMPRENANT LE SYSTEME OPTIQUE
Abstract
(EN)
A reflection refraction image-forming optical system which has a desired image-side NA and image circle achieved by using a small number of lenses without inviting enlargement of the reflecting mirror. The optical system comprises a first image-forming optical system having a first group of positive lenses, an aperture stop, and a second group of positive lenses in the order from the object side, and a second image-forming optical system having a main mirror having a first negative reflecting surface which has a first light passing part at its center and a sub-mirror having a second reflecting surface which has a second light passing part at its center. All the refracting members constituting the optical system are made of the same optical material, at least one surface of the refracting and reflecting surfaces is an aspherical surface, and a refracting member spaced from the first and second reflecting surfaces is provided.
(FR)
Un système optique de formation d'image par réflexion réfraction présente un cercle d'image et d'ouverture numérique côté image voulu et obtenu à l'aide d'un petit nombre de lentilles sans nécessiter un grossissement du miroir réfléchissant. Le système optique comprend un premier système optique de formation d'image comportant un premier groupe de lentilles positives, une butée d'ouverture, et un second groupe de lentilles positives dans cet ordre à partir du côté de l'objet, ainsi qu'un second système optique de formation d'image présentant un miroir principal ayant une première surface de réflexion négative dotée d'une première partie de passage de la lumière au niveau de son centre, et un sous-miroir ayant une seconde surface de réflexion présentant une seconde partie de passage de la lumière en son centre. Tous les éléments de réfraction constituant le système optique sont composés du même matériau optique, au moins une surface des surfaces de réfraction et de réflexion est une surface asphérique, et on a prévu un élément de réfraction espacé des première et seconde surfaces de réflexion.
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