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1. WO2000039040 - SYNTHETIC QUARTZ GLASS AND METHOD FOR PREPARATION THEREOF

Publication Number WO/2000/039040
Publication Date 06.07.2000
International Application No. PCT/JP1999/007282
International Filing Date 24.12.1999
IPC
C03B 19/14 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
19Other methods of shaping glass
14by gas-phase reaction processes
C03C 3/06 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
06with more than 90% silica by weight, e.g. quartz
C03C 23/00 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
23Other surface treatment of glass not in the form of fibres or filaments
CPC
C03B 19/1453
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
19Other methods of shaping glass
14by gas- ; or vapour-; phase reaction processes
1453Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
C03B 2201/03
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
02Pure silica glass, e.g. pure fused quartz
03Impurity concentration specified
C03B 2201/07
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
07Impurity concentration specified
C03B 2201/075
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
07Impurity concentration specified
075Hydroxyl ion (OH)
C03B 2201/12
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
08doped with boron or fluorine or other refractive index decreasing dopant
12doped with fluorine
C03B 2201/21
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
20doped with non-metals other than boron or fluorine
21doped with molecular hydrogen
Applicants
  • ASAHI GLASS COMPANY, LIMITED [JP/JP]; 12-1, Yurakucho 1-chome Chiyoda-ku Tokyo 100-8405, JP (AllExceptUS)
  • IKUTA, Yoshiaki [JP/JP]; JP (UsOnly)
  • KIKUGAWA, Shinya [JP/JP]; JP (UsOnly)
  • MASUI, Akio [JP/JP]; JP (UsOnly)
  • SHIMODAIRA, Noriaki [JP/JP]; JP (UsOnly)
  • YOSHIZAWA, Shuhei [JP/JP]; JP (UsOnly)
Inventors
  • IKUTA, Yoshiaki; JP
  • KIKUGAWA, Shinya; JP
  • MASUI, Akio; JP
  • SHIMODAIRA, Noriaki; JP
  • YOSHIZAWA, Shuhei; JP
Agents
  • OGAWA, Toshiharu ; Torimoto Kogyo Building 38, Kanda-Higashimatsushitacho Chiyoda-ku Tokyo 101-0042, JP
Priority Data
10/37001425.12.1998JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) SYNTHETIC QUARTZ GLASS AND METHOD FOR PREPARATION THEREOF
(FR) VERRE DE QUARTZ SYNTHETIQUE ET PROCEDE DE PREPARATION ASSOCIE
Abstract
(EN)
A synthetic quartz glass to be used for vacuum ultraviolet lights having a wavelength of 175 nm or less which is characterized in that it has an OH group content of 100 ppm or less and is substantially free of reducing type defects.
(FR)
La présente invention concerne un verre de quartz synthétique destiné aux lampes ultraviolettes à vide présentant une longueur d'onde de 175 nm ou moins, caractérisé en ce qu'il possède une teneur en groupe OH de 100 ppm ou moins et ne contient sensiblement pas de défauts de type réducteur.
Also published as
US09623152
Latest bibliographic data on file with the International Bureau