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1. WO2000039038 - METHOD FOR PRODUCING OPTICAL QUARTZ GLASS FOR EXCIMER LASERS

Considered void:  26.06.2000
Publication Number WO/2000/039038
Publication Date 06.07.2000
International Application No. PCT/EP1999/010282
International Filing Date 22.12.1999
IPC
C03B 19/14 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
19Other methods of shaping glass
14by gas-phase reaction processes
C03B 32/00 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
32Thermal after-treatment of glass products not provided for in groups C03B25/-C03B31/121
C03C 3/06 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
06with more than 90% silica by weight, e.g. quartz
CPC
C03B 19/1453
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
19Other methods of shaping glass
14by gas- ; or vapour-; phase reaction processes
1453Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
C03B 2201/075
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
07Impurity concentration specified
075Hydroxyl ion (OH)
C03B 2201/21
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
20doped with non-metals other than boron or fluorine
21doped with molecular hydrogen
C03B 32/00
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
32Thermal after-treatment of glass products not provided for in groups ; C03B19/00; , C03B25/00 - C03B31/00 ; or C03B37/00; , e.g. crystallisation, eliminating gas inclusions or other impurities; ; Hot-pressing vitrified, non-porous, shaped glass products
C03C 2201/21
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2201Glass compositions
06Doped silica-based glasses
20containing non-metals other than boron or halide
21containing molecular hydrogen
C03C 2203/54
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2203Production processes
50After-treatment
52Heat-treatment
54in a dopant containing atmosphere
Applicants
  • HERAEUS QUARZGLAS GMBH & CO. KG [DE/DE]; Quarzstrasse D-63450 Hanau, DE (AllExceptUS)
  • SHIN-ETSU QUARTZ PRODUCTS CO., LTD. [JP/JP]; 22-2, Nishi-Shinjuku 1-chome Shinjuku-ku Tokyo 160-0023, JP (AllExceptUS)
  • FUJINOKI, Akira [JP/JP]; JP (UsOnly)
  • OSHIMA, Takayuki [JP/JP]; JP (UsOnly)
  • NISHIMURA, Hiroyuki [JP/JP]; JP (UsOnly)
Inventors
  • FUJINOKI, Akira; JP
  • OSHIMA, Takayuki; JP
  • NISHIMURA, Hiroyuki; JP
Agents
  • KÜHN, Hans-Christian; Heraeus Holding GmbH Schutzrechte Heraeusstrasse 12-14 D-63450 Hanau, DE
Priority Data
10/37108425.12.1998JP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR PRODUCING OPTICAL QUARTZ GLASS FOR EXCIMER LASERS
(FR) PRODUCTION DE VERRE DE SILICE DE QUALITE OPTIQUE POUR LASERS A EXCIMERES
Abstract
(EN)
An object of the present invention is to provide a method for producing a large optical quartz glass for use in excimer lasers, which exhibits high transmittance to excimer laser radiations and which is yet resistant to lasers. This problem can be solved by a method for producing an optical quartz glass for use in excimer lasers, comprising a step of forming a porous silica preform by depositing soot-like silica formed by flame hydrolysis of a high-purity volatile silicon compound, a step of obtaining a quartz glass body by heating the porous silica preform in an oxidizing atmosphere and vitrifying the resulting body into a transparent body, and a step of performing a heat treatment in a reducing atmosphere comprising hydrogen. The oxidizing heat treatment generates oxygen defects, the hydrogen treatment results in a silica body doped with hydrogen molecules and free of said defects.
(FR)
La présente invention concerne un procédé de production de grandes pièces de verre de silice de qualité optique pour lasers à excimères, lequel verre fait preuve d'un très grand pouvoir de transmission des rayonnements des lasers à excimères tout en étant résistant aux lasers. Pour produire un tel verre de silice de qualité optique destiné aux lasers à excimères, on commence par réaliser une silice poreuse par dépôt de suie de silice résultant d'une hydrolyse à la flamme d'un composé de silicium volatil de haute pureté. On réalise ensuite un corps de verre de silice en chauffant l'ébauche de silice poreuse dans une atmosphère oxydante puis en vitrifiant le corps résultant jusqu'à obtenir un corps transparent. On exécute enfin un traitement thermique dans une atmosphère réductrice comprenant de l'hydrogène. Le traitement thermique d'oxydation produit des défauts d'oxygène, et le traitement à l'hydrogène donne un corps de silice dopé de molécules d'hydrogène et exempt desdits défauts.
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