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1. WO2000031163 - POLY(ARYLENE ETHER) HOMOPOLYMER COMPOSITIONS AND METHODS OF MANUFACTURE THEREOF

Publication Number WO/2000/031163
Publication Date 02.06.2000
International Application No. PCT/US1999/027516
International Filing Date 19.11.1999
Chapter 2 Demand Filed 20.06.2000
IPC
C08G 65/40 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
34from hydroxy compounds or their metallic derivatives
38derived from phenols
40from phenols and other compounds
H01L 23/498 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
23Details of semiconductor or other solid state devices
48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads or terminal arrangements
488consisting of soldered or bonded constructions
498Leads on insulating substrates
H01L 23/532 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
23Details of semiconductor or other solid state devices
52Arrangements for conducting electric current within the device in operation from one component to another
522including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
532characterised by the materials
H05K 1/03 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
1Printed circuits
02Details
03Use of materials for the substrate
CPC
C08G 2650/48
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
2650Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
28characterised by the polymer type
46containing halogen
48containing fluorine, e.g. perfluropolyethers
C08G 65/40
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
65Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
34from hydroxy compounds or their metallic derivatives
38derived from phenols
40from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
C08G 65/4006
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
65Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
34from hydroxy compounds or their metallic derivatives
38derived from phenols
40from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
4006(I) or (II) containing elements other than carbon, oxygen, hydrogen or halogen as leaving group (X)
C08G 65/4012
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
65Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
34from hydroxy compounds or their metallic derivatives
38derived from phenols
40from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
4012Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
C08G 65/4025
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
65Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
34from hydroxy compounds or their metallic derivatives
38derived from phenols
40from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
4012Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
4018(I) or (II) containing halogens other than as leaving group (X)
4025(I) or (II) containing fluorine other than as leaving group (X)
C08L 2203/20
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
2203Applications
20use in electrical or conductive gadgets
Applicants
  • ALLIEDSIGNAL INC. [US]/[US]
Inventors
  • LAU, Kreisler, S., Y.
  • CHEN, Tian-An
  • KPROLEV, Boris, A.
  • BROUK, Emma
Agents
  • CRISS, Roger, H.
Priority Data
09/197,47820.11.1998US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) POLY(ARYLENE ETHER) HOMOPOLYMER COMPOSITIONS AND METHODS OF MANUFACTURE THEREOF
(FR) COMPOSITIONS A BASE DE POLY(ARYLENE ETHER) HOMOPOLYMERE ET PROCEDES DE FABRICATION
Abstract
(EN)
Dielectric compositions encompassing one or more poly(arylene ether) polymers are provided. The dielectric compositions have the repetitive structural unit formula (I) where n=l to 200, Y and Ar are each a divalent arylene radical, Y derived from bisphenol compounds of general formula HO-Y-OH, Ar derived from difluoro diarylacetylenes and/or ethynylated benzophenones of general formula F-Ar-F and Z is optionally hydrogen, a methyl group or derived from a monofluoro-benzophenone derivative of general formula Z-F. Such poly(arylene ether) polymers are employed with a variety of microelectronic devices, for example, integrated circuits and multichip modules.
(FR)
L'invention concerne des compositions diélectriques renfermant un ou plusieurs poly(arylène éther) polymères, qui comportent l'unité structurelle répétitive formule (I). Dans cette unité, n a une valeur comprise entre 1 et 200, Y et Ar sont chacun un radical arylène divalent, Y est dérivé de composés à base de bisphénol représentés par la formule générale HO-Y-OH, Ar est dérivé de composés à base de difluoro diarylacétylènes et/ou de benzophénones éthynylées représentés par la formule générale F-Ar-F et Z est éventuellement hydrogène, un groupe méthyle ou issu d'un dérivé de monofluoro-benzophénone représenté par la formule générale Z-F. Ces poly(arylène éther) polymères sont utilisés dans une variété de dispositifs microélectroniques (par exemple, circuits intégrés et boîtiersultipuce).
Also published as
Latest bibliographic data on file with the International Bureau