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Machine translation
1. (WO2000029172) BACK-UP PAD FOR ABRASIVE ARTICLES AND METHOD OF MAKING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/029172    International Application No.:    PCT/US1999/003940
Publication Date: 25.05.2000 International Filing Date: 24.02.1999
Chapter 2 Demand Filed:    09.05.2000    
IPC:
B24B 55/10 (2006.01), B24D 9/08 (2006.01)
Applicants: MINNESOTA MINING AND MANUFACTURING COMPANY [US/US]; 3M Center P.O. Box 33427 Saint Paul, MN 55133-3427 (US)
Inventors: MANOR, Edward, L.; (US).
ROEKER, David, C.; (US)
Agent: TRUSSELL, James, J.; Minnesota Mining and Manufacturing Company Office of Intellectual Property Counsel P.O. Box 33427 Saint Paul, MN 55133-3427 (US).
VOSSIUS & PARTNER; Patentwalte P.O. Box 86 07 67 81634 Munchen (DE)
Priority Data:
09/195,299 18.11.1998 US
Title (EN) BACK-UP PAD FOR ABRASIVE ARTICLES AND METHOD OF MAKING
(FR) TAMPON D'APPOINT POUR ARTICLES ABRASIFS ET PROCEDE DE FABRICATION ASSOCIE
Abstract: front page image
(EN)A back-up pad (10) for supporting an abrasive article. A preferred embodiment of the invention provides a back-up pad (10) having a dust collection groove (30), in which the engagement component (18) to said first major surface (14) of said support member (12) and is attached to said groove surface (32). The present invention also provides a method for forming a back-up pad (10) with a dust collection groove (30).
(FR)L'invention concerne un tampon d'appoint (10) destiné à supporter un article abrasif. Dans l'un des modes de réalisation préférés, ledit tampon (10) comporte une rainure collectrice de poussière (30), dans laquelle le composant de contact (18) est fixé sur une surface majeure (14) d'un élément support (12) et sur une surface (32) de ladite rainure. L'invention concerne également un procédé permettant de former un tampon d'appoint (10) comportant une rainure collectrice de poussière (30).
Designated States: CA, CN, JP, KR, MX.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: English (EN)
Filing Language: English (EN)