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Machine translation
1. (WO2000026956) A METHOD AND APPARATUS FOR ETCHING A SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/026956    International Application No.:    PCT/GB1999/003630
Publication Date: 11.05.2000 International Filing Date: 03.11.1999
Chapter 2 Demand Filed:    02.06.2000    
IPC:
H01L 21/3065 (2006.01), H01L 21/3213 (2006.01)
Applicants: SURFACE TECHNOLOGY SYSTEMS LIMITED [GB/GB]; Imperial Park Newport Gwent NP1 9UJ (GB) (For All Designated States Except US).
BHARDWAJ, Jyoti, Kiron [GB/GB]; (GB) (For US Only).
ASHRAF, Huma [GB/GB]; (GB) (For US Only).
HOPKINS, Janet [GB/GB]; (GB) (For US Only).
LEA, Leslie, Michael [GB/GB]; (GB) (For US Only).
HYNES, Alan, Michael [GB/GB]; (GB) (For US Only).
JOHNSTON, Ian, Ronald [GB/GB]; (GB) (For US Only)
Inventors: BHARDWAJ, Jyoti, Kiron; (GB).
ASHRAF, Huma; (GB).
HOPKINS, Janet; (GB).
LEA, Leslie, Michael; (GB).
HYNES, Alan, Michael; (GB).
JOHNSTON, Ian, Ronald; (GB)
Agent: JAMES, Michael, John, Gwynne; Wynee-Jones, Lainé & James Essex Place 22 Rodney Road Cheltenham GL50 1JJ (GB)
Priority Data:
9824077.3 04.11.1998 GB
9901867.3 29.01.1999 GB
9912376.2 28.05.1999 GB
Title (EN) A METHOD AND APPARATUS FOR ETCHING A SUBSTRATE
(FR) PROCEDE ET APPAREIL DE GRAVURE DE SUBSTRAT
Abstract: front page image
(EN)There is disclosed a method and apparatus for etching a substrate. The method comprises the steps of etching a substrate or alternately etching and depositing a passivation layer. A bias frequency, which may be pulsed, may be applied to the substrate and may be at or below the ion plasma frequency.
(FR)L'invention se rapporte à un procédé et à un appareil de gravure de substrat. Ledit procédé consiste à graver un substrat ou à alternativement graver et déposer une couche de passivation. Il est possible d'appliquer au substrat une fréquence de polarisation qui peut être pulsée et peut être à une valeur inférieure ou égale à la fréquence du plasma ionique.
Designated States: JP, KR, US.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: English (EN)
Filing Language: English (EN)