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1. WO2000026725 - PHOTOCURABLE AND PHOTOPATTERNABLE HYDROGEL MATRIX BASED ON AZLACTONE COPOLYMERS

Publication Number WO/2000/026725
Publication Date 11.05.2000
International Application No. PCT/US1999/005143
International Filing Date 08.03.1999
Chapter 2 Demand Filed 04.04.2000
IPC
G03F 7/012 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
008Azides
012Macromolecular azides; Macromolecular additives, e.g. binders
G03F 7/038 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
CPC
G03F 7/0125
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
008Azides
012Macromolecular azides; Macromolecular additives, e.g. binders
0125characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
G03F 7/038
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
Y10T 428/249953
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
428Stock material or miscellaneous articles
249921Web or sheet containing structurally defined element or component
249953Composite having voids in a component [e.g., porous, cellular, etc.]
Applicants
  • MINNESOTA MINING AND MANUFACTURING COMPANY [US]/[US]
Inventors
  • LIU, Jie
  • BENTSEN, James, G.
Agents
  • DAHL, Philip, Y.
Priority Data
09/183,19730.10.1998US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PHOTOCURABLE AND PHOTOPATTERNABLE HYDROGEL MATRIX BASED ON AZLACTONE COPOLYMERS
(FR) MATRICE D'HYDROGEL PHOTODURCISSABLE ET PHOTOMODELABLE UTILISANT DES COPOLYMERES D'AZLACTONE
Abstract
(EN)
Photocurable and photopatternable compositions are disclosed which comprise a) at least one copolymer derived from 1 to 99 parts by weight of at least one azlactone-functional monomer and 0 to 99 parts of at least one co-monomer; and b) at least one photocrosslinker. Articles are disclosed comprising a substrate and a gel layer of the cured composition which may be photopatterned with high resolution and used to bind biomolecules to the substrate.
(FR)
L'invention concerne des compositions photodurcissables et photomodelables renfermant a) au moins un copolymère compris entre 1 et 99 parties en poids dérivé d'au moins un monomère fonctionnel d'azlactone et entre 0 et 99 parties d'au moins un co-monomère, et b) au moins un photoréticulateur. L'invention concerne également des articles comprenant un substrat et une couche de gel de la composition durcie qui peut être photomodelée à haute résolution et utilisée pour lier des biomolécules au substrat.
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