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Machine translation
1. (WO2000026703) WAVELENGTH TUNING OF PHOTO-INDUCED GRATINGS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/026703    International Application No.:    PCT/US1999/023326
Publication Date: 11.05.2000 International Filing Date: 07.10.1999
Chapter 2 Demand Filed:    13.03.2000    
IPC:
G03F 7/20 (2006.01)
Applicants: CORNING INCORPORATED [US/US]; 1 Riverfront Plaza Corning, NY 14831 (US) (For All Designated States Except US).
BHATIA, Vikram [IN/US]; (US) (For US Only).
MODAVIS, Robert, A. [US/US]; (US) (For US Only)
Inventors: BHATIA, Vikram; (US).
MODAVIS, Robert, A.; (US)
Agent: REDMAN, Mary, Y.; Corning Incorporated Patent Dept. SP TI 3-1 Corning, NY 14831 (US).
SHORT, Svetlana, Z.; Patent Department SP TI 3-1 Corning Incorporated Corning, NY 14831 (US)
Priority Data:
60/106,512 30.10.1998 US
Title (EN) WAVELENGTH TUNING OF PHOTO-INDUCED GRATINGS
(FR) ACCORD EN FREQUENCE DE RESEAUX DE DIFFRACTION PHOTO-INDUITS
Abstract: front page image
(EN)Optical gratings having a range of possible Bragg wavelengths can be produced using a single phase mask by exposing the mask to a non-collimated spatially filtered beam of light. A spatial filter (30) removes high spatial frequency components from the beam, and a focusing system (36) directs the filtered beam to a phase mask (40). A rate at which the beam is focused and a spacing between the phase mask and a photo-sensitive waveguide (12) are varied to produce gratings in the waveguide having a range of possible periods.
(FR)On peut produire des réseaux de diffraction optiques possédant une plage de longueurs d'ondes de Bragg possibles, en utilisant un seul masque de phase, en exposant ce dernier à un faisceau lumineux filtré non collimaté dans l'espace. Un filtre spatial (30) supprime les composantes de fréquence spatiale élevée dudit faisceau, et un système de concentration (36) dirige le faisceau filtré sur un masque de phase (40). On modifie la vitesse à laquelle le faisceau est concentré et l'espacement entre le masque de phase et un guide d'onde photosensible (12) pour produire des réseaux de diffraction dans le guide d'onde présentant une plage de périodes possibles.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, US, UZ, VN, YU, ZW.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: English (EN)
Filing Language: English (EN)