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1. (WO2000026219) OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/026219    International Application No.:    PCT/EP1999/007876
Publication Date: 11.05.2000 International Filing Date: 18.10.1999
Chapter 2 Demand Filed:    03.02.2000    
IPC:
C07C 255/64 (2006.01), C07D 333/36 (2006.01)
Applicants: CIBA SPECIALTY CHEMICALS HOLDING INC. [CH/CH]; Klybeckstrasse 141, CH-4057 Basel (CH) (For All Designated States Except US).
YAMATO, Hitoshi [JP/JP]; (JP) (For US Only).
ASAKURA, Toshikage [JP/JP]; (JP) (For US Only).
BIRBAUM, Jean-Luc [CH/CH]; (CH) (For US Only).
DIETLIKER, Kurt [CH/CH]; (CH) (For US Only)
Inventors: YAMATO, Hitoshi; (JP).
ASAKURA, Toshikage; (JP).
BIRBAUM, Jean-Luc; (CH).
DIETLIKER, Kurt; (CH)
Common
Representative:
CIBA SPECIALTY CHEMICALS HOLDING INC.; Patentabteilung, Klybeckstrasse 141, CH-4057 Basel (CH)
Priority Data:
98811084.7 29.10.1998 EP
Title (EN) OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS
(FR) DERIVES D'OXIME ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
Abstract: front page image
(EN)New oxime derivatives of formula (I) or (II), wherein m is 0 or 1; R¿1? inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R'¿1? is for example C¿2?-C¿12?alkylene, phenylene, naphthylene; R¿2? is CN; R¿3? is C¿2?-C¿6?haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R¿4?, R¿5?, R¿10? and R¿11? inter alia are hydrogen, C¿1?-C¿6?alkyl, C¿1?-C¿6?alkoxy; R¿6? inter alia is hydrogen, phenyl, C¿1?-C¿12?alkyl; R¿7? and R¿8? inter alia are hydrogen, C¿1?-C¿12?alkyl; or R¿7? and R¿8?, together with the nitrogen atom to which they are bonded, form a 5-, 6- or 7-membered ring; R¿9? is for example C¿1?-C¿12?alkyl; and A inter alia is S, O, NR¿7a?; are useful as latent acids, especially in photoresist applications.
(FR)L'invention concerne des nouveaux dérivés d'oxime représentés par les formules (I) ou (II), dans lesquelles m vaut 0 ou 1; R¿1? représente, entre autres, phényle, naphtyle, anthracyle, phénanthryle ou un radical hétéroaryle; R'¿1? représente, par exemple, C¿2?-C¿12?alkylène, phénylène, naphtylène; R¿2? représente CN; R¿3? représente C¿2?-C¿6?haloalcanoyle, halobenzoyle, un groupe organosilyle ou phosphoryle; R¿4?, R¿5?, R¿10? et R¿11? représentent, entre autres, hydrogène, C¿1?-C¿6?alkyle, C¿1?-C¿6?alcoxy; R¿6? représente, entre autres, hydrogène, phényle, C¿1?-C¿12?alkyle; R¿7? et R¿8? représentent, entre autres, hydrogène, C¿1?-C¿12?alkyle; ou R¿7? et R¿8?, conjointement avec l'atome d'azote auquel ils sont liés, forment un cycle à 5-, 6- ou 7 éléments; R¿9? représente, par exemple, C¿1?-C¿12?alkyle; and A représente, entre autres, S, O, NR¿7a?. Lesdits dérivés sont utiles en tant qu'acides latents, notamment dans des applications de photorésist.
Designated States: AE, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CR, CU, CZ, DE, DK, DM, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, TZ, UA, UG, US, UZ, VN, YU, ZA, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)