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Machine translation
1. (WO2000024839) ANTISTATIC PRESSURE-SENSITIVE ADHESIVE COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2000/024839    International Application No.:    PCT/US1999/022333
Publication Date: 04.05.2000 International Filing Date: 28.09.1999
Chapter 2 Demand Filed:    05.05.2000    
IPC:
C08F 283/00 (2006.01), C09J 7/02 (2006.01), C09J 151/08 (2006.01), C09J 175/16 (2006.01)
Applicants: MINNESOTA MINING AND MANUFACTURING COMPANY [US/US]; 3M Center P.O. Box 33427 St. Paul, MN 55133-3427 (US) (For All Designated States Except US).
SUWA, Toshihiro [JP/JP]; (JP) (For US Only)
Inventors: SUWA, Toshihiro; (JP)
Agent: FONSECA, Darla, P.; 3M Innovative Properties Company Office of Intellectual Property Counsel P.O. Box 33427 Saint Paul, MN 55133-3427 (US)
Priority Data:
10-305164 27.10.1998 JP
Title (EN) ANTISTATIC PRESSURE-SENSITIVE ADHESIVE COMPOSITION
(FR) COMPOSITION ADHESIVE ANTISTATIQUE SENSIBLE A LA PRESSION
Abstract: front page image
(EN)An antistatic pressure-sensitive adhesive composition comprising a copolymer produced upon irradiation polymerization of a polymeric mixture containing a urethane acrylate, a (meth)acrylate having a polyalkylene oxide chain and an adhesion-imparting monomer and the adhesive also contains an ionic compound.
(FR)Composition adhésive antistatique sensible à la pression qui contient (1) un copolymère produit par polymérisation par rayonnement d'un mélange polymère contenant un acrylate d'uréthanne, un (méth)acrylate ayant une chaîne oxyde de polyalkylène et un monomère conférant le pouvoir adhésif et (2) un composé ionique.
Designated States: CN, KR, US.
Publication Language: English (EN)
Filing Language: English (EN)