Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2000021689) MICROSCALE PATTERNING AND ARTICLES FORMED THEREBY
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2000/021689 International Application No.: PCT/US1999/023717
Publication Date: 20.04.2000 International Filing Date: 08.10.1999
Chapter 2 Demand Filed: 09.05.2000
IPC:
G03F 7/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Applicants:
CHOU, Stephen, Y. [US/US]; US (UsOnly)
ZHUANG, Lei [CN/US]; US (UsOnly)
THE TRUSTEES OF PRINCETON UNIVERSITY [US/US]; Fifth Floor New South Building Post Office Box 36 Princeton, NJ 08544-0036, US (AllExceptUS)
Inventors:
CHOU, Stephen, Y.; US
ZHUANG, Lei; US
Agent:
MILLER, Raymond, A.; Benesch, Friedlander, Coplan & Aronoff LLP 2300 BP Tower 200 Public Square Cleveland, OH 44114-2378, US
Priority Data:
60/103,79009.10.1998US
Title (EN) MICROSCALE PATTERNING AND ARTICLES FORMED THEREBY
(FR) FORMATION DE MOTIFS MICROSCOPIQUES ET ARTICLES FORMES
Abstract:
(EN) The present invention is directed to a lithographic method and apparatus for creating micrometer sub-micrometer patterns in a thin film coated on a substrate. The invention utilizes the self-formation of periodic, supramolecular pillar arrays (49) in a melt to form the patterns. The self-formation is induced by placing a plate or mask (35) a distance above the polymer film (33). The pillars bridge the plate and the mask, having a height equal to the plate-mask separation and preferably 2-7 times that of the film's initial thickness. If the surface of the mask has a protruding pattern, the pillar array is formed with the edge of the pillar array aligned to the boundary of the mask pattern.
(FR) L'invention concerne un procédé et un appareil de lithographie, permettant de créer un micromètre, et plus particulièrement des motifs de sous-micromètre dans une couche mince appliquée sur un substrat. L'invention utilise l'auto-formation de réseaux de colonnettes (49) supramoléculaires périodiques dans un mélange fondu, afin de former des motifs. L'auto-formation est induite par placement d'une plaque ou d'un masque (35) à distance du film polymère. Les colonnettes qui relient la plaque et le masque, présentent une hauteur égale à la distance plaque-masque, et de préférence 2-7 fois celle de l'épaisseur initiale du film. Si la surface du masque possède un motif en saillie, les colonnettes formées sur les bords du réseau de colonnettes sont alignées par rapport à la limite du motif de masque.
front page image
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, US, UZ, VN, YU, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, SD, SL, SZ, TZ, UG, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)