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1. WO1999055491 - CHEMICAL MECHANICAL POLISHING WITH MULTIPLE POLISHING PADS

Publication Number WO/1999/055491
Publication Date 04.11.1999
International Application No. PCT/US1999/007588
International Filing Date 06.04.1999
Chapter 2 Demand Filed 10.11.1999
IPC
B24B 37/04 2012.01
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37Lapping machines or devices; Accessories
04designed for working plane surfaces
B24B 7/22 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
7Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
20characterised by a special design with respect to properties of the material of non-metallic articles to be ground
22for grinding inorganic material, e.g. stone, ceramics, porcelain
B24D 13/14 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
DTOOLS FOR GRINDING, BUFFING OR SHARPENING
13Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
14acting by the front face
CPC
B24B 37/013
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
37Lapping machines or devices; Accessories
005Control means for lapping machines or devices
013Devices or means for detecting lapping completion
B24B 37/042
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
37Lapping machines or devices; Accessories
04designed for working plane surfaces
042operating processes therefor
B24B 37/205
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
37Lapping machines or devices; Accessories
11Lapping tools
20Lapping pads for working plane surfaces
205provided with a window for inspecting the surface of the work being lapped
B24B 37/245
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
37Lapping machines or devices; Accessories
11Lapping tools
20Lapping pads for working plane surfaces
24characterised by the composition or properties of the pad materials
245Pads with fixed abrasives
B24B 49/12
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
49Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
12involving optical means
Applicants
  • APPLIED MATERIALS, INC. [US]/[US]
Inventors
  • SOMEKH, Sasson
Agents
  • BERNADICOU, Michael, A.
Priority Data
09/066,27124.04.1998US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) CHEMICAL MECHANICAL POLISHING WITH MULTIPLE POLISHING PADS
(FR) POLISSAGE CHIMIO-MECANIQUE A L'AIDE DE PLUSIEURS TAMPONS DE POLISSAGE
Abstract
(EN)
In chemical mechanical polishing, a substrate is planarized with one or more fixed-abrasive polishing pads (110). Then the substrate is polished with a standard polishing pad (100) to remove scratch defects created by the fixed-abrasive polishing pads (110).
(FR)
Selon le procédé de polissage chimio-mécanique de cette invention, un substrat est aplani à l'aide d'un ou plusieurs tampons (110) de polissage abrasifs fixes. Puis le substrat est poli avec un tampon (100) de polissage standard pour éliminer les rayures provoquées par les tampons (110) de polissage abrasifs fixes.
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