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Machine translation
1. (WO1999040485) PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1999/040485    International Application No.:    PCT/US1999/002557
Publication Date: 12.08.1999 International Filing Date: 05.02.1999
Chapter 2 Demand Filed:    03.09.1999    
IPC:
C07C 39/15 (2006.01), C07D 317/64 (2006.01), G03F 7/022 (2006.01)
Applicants: OLIN MICROELECTRONIC CHEMICALS, INC. [US/US]; 501 Merritt 7 P.O. Box 4500 Norwalk, CT 06856-4500 (US)
Inventors: BLAKENEY, Andrew, J.; (US).
MEDINA, Arturo, N.; (US).
TOUKHY, Medhat, A.; (US).
FERREIRA, Lawrence; (US).
JEFFRIES, Alfred, T., III; (US).
NAIINI, Ahmad; (US)
Agent: GREELEY, Paul, D.; Ohlandt, Greeley, Ruggiero & Perle, L.L.P. 9th floor One Landmark Square Stamford, CT 06901-2682 (US)
Priority Data:
09/019,958 06.02.1998 US
Title (EN) PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES
(FR) ESTERS PHOTOSENSIBLES DE DIAZONAPHTOQUINONE A BASE DE COMPOSES PHENOLIQUES CONTENANT UN ALKYLE ETHER CYCLIQUE SELECTIONNE, ET UTILISATION DESDITS ESTERS DANS DES MELANGES SENSIBLES AUX RAYONNEMENTS
Abstract: front page image
(EN)A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II), wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.
(FR)L'invention concerne un composé photosensible comprenant au moins un ester d'acide sulfonique o-quinonediazide tiré d'un composé phénolique. Ces esters sont choisis dans le groupe représenté par la formule (II). Le composé photosensible intervient dans une composition sensible aux rayonnements et pour un procédé utilisé pour créer une image à motifs positifs.
Designated States: JP, KR.
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: English (EN)
Filing Language: English (EN)