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1. (WO1999040081) NOVEL ANTIFUNGAL COMPOUNDS AND PROCESS FOR PRODUCING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1999/040081    International Application No.:    PCT/JP1999/000541
Publication Date: 12.08.1999 International Filing Date: 08.02.1999
Chapter 2 Demand Filed:    11.06.1999    
IPC:
A01N 43/24 (2006.01), A01N 43/40 (2006.01), A01N 43/54 (2006.01), C07D 321/00 (2006.01), C07D 405/12 (2006.01)
Applicants: MEIJI SEIKA KAISHA, LTD. [JP/JP]; 4-16, Kyobashi 2-chome Chuo-ku, Tokyo 104-8002 (JP) (For All Designated States Except US).
SAKANAKA, Osamu [JP/JP]; (JP).
TERAOKA, Takeshi [JP/JP]; (JP).
MITOMO, Koichi [JP/JP]; (JP) (For US Only).
TAMURA, Takayoshi [JP/JP]; (JP) (For US Only).
MURAI, Yasushi [JP/JP]; (JP) (For US Only).
IINUMA, Katsuharu [JP/JP]; (JP) (For US Only).
KUZUHARA, Kikuko [JP/JP]; (JP) (For US Only).
MIKOSHIBA, Haruki [JP/JP]; (JP) (For US Only).
TANIGUCHI, Makoto [JP/JP]; (JP) (For US Only)
Inventors: SAKANAKA, Osamu; (JP).
TERAOKA, Takeshi; (JP).
MITOMO, Koichi; (JP).
TAMURA, Takayoshi; (JP).
MURAI, Yasushi; (JP).
IINUMA, Katsuharu; (JP).
KUZUHARA, Kikuko; (JP).
MIKOSHIBA, Haruki; (JP).
TANIGUCHI, Makoto; (JP)
Agent: SATO, Kazuo; Kyowa Patent & Law Office Fuji Building, Room 323 2-3, Marunouchi 3-chome Chiyoda-ku Tokyo 100-0005 (JP)
Priority Data:
10/26257 06.02.1998 JP
Title (EN) NOVEL ANTIFUNGAL COMPOUNDS AND PROCESS FOR PRODUCING THE SAME
(FR) NOUVEAUX COMPOSES ANTIFONGIQUES ET LEUR PROCEDE DE PRODUCTION
Abstract: front page image
(EN)Compounds represented by general formula (I) which have potent antifungal activity without showing any chemical injury to man, beast or agricultural/horticultural plants to which the compounds are to be applied and show high photostability, wherein R?1¿ represents isobutyryl, tigloyl, isovaleryl or 2-methylbutanoyl; R?2¿ represents hydrogen, aromatic carboxylate or an amino-protective group; and R?3¿ represents hydrogen, nitro, amino, acylamino or N,N-dialkylamino (provided that the case where R?1¿ is isobutyryl, tigloyl, isovaleryl or 2-methylbutanoyl and R?3¿ is hydrogen, and then R?2¿ is 3-hydroxypicolinate, 3-hydroxy-4-methoxypicolinate or 3,4-dimethoxypicolinate is excluded).
(FR)L'invention concerne des composés représentés par la formule générale (I) présentant une activité antifongique puissante sans agression chimique pour l'homme, les animaux ou les plantes agricoles/horticoles auxquels sont appliqués les composés, lesquels présentent une photostabilité élevée, formule dans laquelle R?1¿ représente isobutyryle, tigloyle, isovaléryle ou 2-méthylbutanoyle; R?2¿ représente hydrogène, carboxylate aromatique ou un groupe amino-protecteur; et R?3¿ représente hydrogène, nitro, amino, acylamino ou N,N-dialkylamino (à condition que soit exclu le cas dans lequel R1 représente isobutyryle, tigloyle, isovaléryle ou 2-méthylbutanoyle et R3 représente hydrogène, et ensuite R2 représente 3-hydroxypicolinate, 3-hydroxy-4-méthoxypicolinate ou 3,4-diméthoxypicolinate).
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, US, UZ, VN, YU, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)