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1. WO1999033087 - FOCUS RINGS AND METHODS THEREFOR

Publication Number WO/1999/033087
Publication Date 01.07.1999
International Application No. PCT/US1998/026412
International Filing Date 11.12.1998
Chapter 2 Demand Filed 08.07.1999
IPC
H01J 37/32 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
CPC
H01J 37/32
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
H01J 37/32623
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32623Mechanical discharge control means
H01J 37/32642
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32623Mechanical discharge control means
32642Focus rings
Y10S 156/915
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
156Adhesive bonding and miscellaneous chemical manufacture
915Differential etching apparatus including focus ring surrounding a wafer for plasma apparatus
Applicants
  • LAM RESEARCH CORPORATION [US]/[US]
Inventors
  • DHINDSA, Rajinder
  • TOKUNAGA, Ken
  • SINGH, Vikram
Agents
  • NGUYEN, Joseph, A.
Priority Data
08/993,79119.12.1997US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) FOCUS RINGS AND METHODS THEREFOR
(FR) BAGUES DE MISE AU POINT PERFECTIONNEES ET PROCEDES ASSOCIES
Abstract
(EN) An improved focus ring configured for use in a plasma processing chamber is disclosed. The focus ring is configured to overlap at least a portion of a substrate-holding chuck that is powered by radio frequency (RF) power during plasma operation to act as an electrode. The focus ring includes an upper surface that is exposed to a plasma region within the plasma processing chamber during the plasma operation. The focus ring further includes a chuck-overlapping portion that overlaps the portion of the substrate-holding chuck, at least a portion of the chuck-overlapping portion being formed of a first material having a lower dielectric constant than a remainder of the focus ring.
(FR) Bague de mise au point perfectionnée conçue pour être utilisée dans une chambre de traitement au plasma. Ladite bague de mise au point est configurée de sorte qu'elle recouvre au moins une partie d'un mandrin porte-substrat alimenté en radiofréquence pendant l'opération au plasma, pour qu'il agisse comme une électrode. La bague de mise au point comporte une surface supérieure qui est exposée à une zone de plasma située dans la chambre de traitement au plasma, pendant l'opération au plasma. Elle présente également une partie chevauchant une partie du mandrin porte-substrat, au moins une partie de la partie chevauchant le mandrin étant constituée d'un premier matériau ayant une constante diélectrique inférieure au reste de la bague de mise au point.
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