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1. (WO1999012074) PHOTOMASK CASE, CONVEYING DEVICE, AND CONVEYING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1999/012074    International Application No.:    PCT/JP1998/003738
Publication Date: 11.03.1999 International Filing Date: 24.08.1998
Chapter 2 Demand Filed:    18.02.1999    
IPC:
G03F 7/20 (2006.01), H01L 21/673 (2006.01)
Applicants: NIKON CORPORATION [JP/JP]; Fuji Building 2-3, Marunouchi 3-chome Chiyoda-ku Tokyo 100-8331 (JP) (AL, AM, AT, AU, AZ, BA, BB, BE, BF, BG, BJ, BR, BY, CA, CF, CG, CH, CI, CM, CN, CU, CY, CZ, DE, DK, EE, ES, FI, FR, GA, GB, GE, GH, GM, GN, GR, GW, HR, HU, ID, IE, IL, IS, IT, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MC, MD, MG, MK, ML, MN, MR, MW, MX, NE, NL, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, SN, SZ, TD, TG, TJ, TM, TR, TT, UA, UG, UZ, VN, YU, ZW only).
HIRAKAWA, Shinichi [JP/JP]; (JP) (For US Only).
NAKAHARA, Kanefumi [JP/JP]; (JP) (For US Only).
ENDO, Yutaka [JP/JP]; (JP) (For US Only)
Inventors: HIRAKAWA, Shinichi; (JP).
NAKAHARA, Kanefumi; (JP).
ENDO, Yutaka; (JP)
Agent: HASEGAWA, Yoshiki; Soei Patent and Law Firm Kyobashi National Building, 6F. 13-10, Kyobashi 2-chome Chuo-ku Tokyo 104-0031 (JP)
Priority Data:
9/247553 29.08.1997 JP
Title (EN) PHOTOMASK CASE, CONVEYING DEVICE, AND CONVEYING METHOD
(FR) BOITIER DE PHOTOMASQUE, DISPOSITIF ET PROCEDE D'ACHEMINEMENT
Abstract: front page image
(EN)A photomask case (210) contains a reticle on which a pattern to be transferred onto a wafer is formed. Positioning recesses (211, 212, 213) into which support pins are inserted are formed on the bottom (210C) of the mask case (210). The shape of a first recess (211) is a triangular pyramid, or a cone and the shape of a second recess (212) is a V-groove.
(FR)Un boîtier (210) de photomasque contient un réticule sur lequel est formé un motif devant être transféré sur une tranche. Des évidements (211, 212, 213) de positionnement sont formés sur le fond (210C) du boîtier (210) de masque; des broches de support étant introduites dans ces évidements. La forme d'un premier évidement (211) est une pyramide triangulaire ou bien un cône et la forme d'un deuxième évidement (212) est une rainure en V.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, GH, GM, HR, HU, ID, IL, IS, KE, KG, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, US, UZ, VN, YU, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)