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1. (WO1999010917) ALIGNER, EXPOSURE METHOD, METHOD OF PRESSURE ADJUSTMENT OF PROJECTION OPTICAL SYSTEM, AND METHOD OF ASSEMBLING ALIGNER

Pub. No.:    WO/1999/010917    International Application No.:    PCT/JP1998/003785
Publication Date: Mar 4, 1999 International Filing Date: Aug 26, 1998
IPC: G03F 7/20
Applicants: NIKON CORPORATION

TANAKA, Yasuaki

NISHIKAWA, Jin

AKAGAWA, Katsuyuki

MIYAKE, Toshihiro

Inventors: TANAKA, Yasuaki

NISHIKAWA, Jin

AKAGAWA, Katsuyuki

MIYAKE, Toshihiro

Title: ALIGNER, EXPOSURE METHOD, METHOD OF PRESSURE ADJUSTMENT OF PROJECTION OPTICAL SYSTEM, AND METHOD OF ASSEMBLING ALIGNER
Abstract:
An aligner in which exposure light from an exposure light source (100) is applied to a reticle (R) through an illuminating optical system (200) and its pattern image is projected onto a photosensitive wafer (W) through a projection optical system (300), and which is equipped with a gas supply device (150) for filling spaces (310, 311) formed between optical elements in a lens barrel (LB) housing the projection optical system (300) therein with an inert gas, pressure sensors (PS2, PS3) for sensing the pressures in the spaces, and optical performance adjustment devices (303, 304) for adjusting the optical performance of the projection optical system (300). The optical performance adjustment device refers to a device for adjusting a distance between a pair of the optical elements or a device for adjusting a pressure in a space between the optical elements.