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1. (WO1999009399) APPARATUS AND METHOD FOR IN-SITU THICKNESS AND STOICHIOMETRY MEASUREMENT OF THIN FILMS

Pub. No.:    WO/1999/009399    International Application No.:    PCT/CA1998/000786
Publication Date: Fri Feb 26 00:59:59 CET 1999 International Filing Date: Thu Aug 20 01:59:59 CEST 1998
IPC: C23C 14/52
C30B 23/02
G01B 15/02
G01N 23/06
Applicants: THE UNIVERSITY OF ALBERTA, SIMON FRASER UNIVERSITY, THE UNIVERSITY OF VICTORIA, AND THE UNIVERSITY OF BRITISH COLUMBIA, doing business as TRIUMF
Inventors: KELSON, Itzhak
LEVY, Yuval
Title: APPARATUS AND METHOD FOR IN-SITU THICKNESS AND STOICHIOMETRY MEASUREMENT OF THIN FILMS
Abstract:
An apparatus and method for using α-particle energy loss to measure the thickness and stoichiometry of films grown by molecular beam epitaxy and other methods. The apparatus for measuring the thickness of films grown on a substrate in a growth chamber, comprises a protective housing having an aperture opening into the growth chamber, a solid state detector disposed in the protective housing, a shutter for opening and closing the aperture, a shield disposed in the housing between the aperture and the solid state detector for shielding the detector, and a calibration source disposed between the shield and the detector for calibrating the measurements made by the detector. A second calibration source disposed between the shutter and the shield, for measuring deposition on the shield.