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1. (WO1999008099) METHOD FOR APPLYING OR REMOVING MATERIAL

Pub. No.:    WO/1999/008099    International Application No.:    PCT/EP1998/004403
Publication Date: Feb 18, 1999 International Filing Date: Jul 15, 1998
IPC: B82B 3/00
G11B 9/00
Applicants: INSTITUT FÜR FESTKÖRPER- UND WERKSTOFFORSCHUNG DRESDEN E.V.
DEUTSCHE TELEKOM AG
KOOPS, Hans, Wilfried, Peter
KRETZ, Johannes
BRÜCKL, Hubert
Inventors: KOOPS, Hans, Wilfried, Peter
KRETZ, Johannes
BRÜCKL, Hubert
Title: METHOD FOR APPLYING OR REMOVING MATERIAL
Abstract:
Disclosed is a method for efficient material application onto substrates or removal therefrom, whereby a scanning probe microscope working under atmospheric pressure is used. According to the inventive method, the substrate is placed in a vessel, which is located on the x-y support of a scanning probe microscope (SXM) and filled with a liquid or gas medium up to a level where the top face of the substrate is covered with a thin layer consisting of at least one monolayer of said medium. In order to cause the medium to produce a structured deposit, or to attack the substrate surface in a structured manner, the microtip of the scanning probe microscope is then dipped into the layer while electric voltage or voltage pulses are applied. The inventive method can be used to apply material onto substrates or remove it therefrom. It can also be used to characterize the geometry of microtips, renew or produce microtips for SXM consoles and to record, read out and erase information.