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1. (WO1998052697) WASHING UNIT FOR JOINT SEAL IN A SEMICONDUCTOR BATH SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/1998/052697 International Application No.: PCT/US1998/010587
Publication Date: 26.11.1998 International Filing Date: 22.05.1998
Chapter 2 Demand Filed: 22.12.1998
IPC:
H01L 21/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applicants:
MIRANDA, Henry, R. [US/US]; US
Inventors:
Agent:
AKA, Gary, T. ; Townsend and Townsend and Crew LLP 8th floor Two Embarcadero Center San Francisco, CA 94111-3834, US
Priority Data:
08/862,63423.05.1997US
Title (EN) WASHING UNIT FOR JOINT SEAL IN A SEMICONDUCTOR BATH SYSTEM
(FR) UNITE DE LAVAGE POUR L'ETANCHEITE D'UN JOINT DANS UN SYSTEME DE BAIN POUR SEMICONDUCTEUR
Abstract:
(EN) The present invention provides for a semiconductor bath system which has a tank (10), a housing (11) which joins the tanks, and a seal for the joint (15) between the housing (11) and the tank (10). A porous conduit (20) is placed in close proximity with the seal. A pump drives washing fluid through the conduit and through the walls of the conduit so that the fluid irrigates the seal to preserve its integrity.
(FR) Un système de bain pour semiconducteur comprend une cuve (10), une enceinte (11) reliée à la cuve et une étanchéité prévue pour le joint (15) existant entre l'enceinte (11) et la cuve (10). Un conduit poreux (20) est placé au voisinage proche du joint. Une pompe envoie du fluide de lavage dans le conduit et sur les parois du conduit de telle sorte que le fluide arrose le joint pour préserver son intégrité.
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Designated States: DE, GB
Publication Language: English (EN)
Filing Language: English (EN)