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1. (WO1998052207) CENTRAL COIL DESIGN FOR IONIZED METAL PLASMA DEPOSITION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/052207 International Application No.: PCT/US1998/010058
Publication Date: 19.11.1998 International Filing Date: 13.05.1998
Chapter 2 Demand Filed: 11.12.1998
IPC:
H01J 37/32 (2006.01) ,H01J 37/34 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054, US
Inventors:
HONG, Liubo; US
WANG, Hougong; US
YAO, Gongda; US
XU, Zheng; US
Agent:
VERPLANCKEN, Donald; Applied Materials, Inc. P.O. Box 450-A Santa Clara, CA 95052 , US
Priority Data:
08/857,71916.05.1997US
Title (EN) CENTRAL COIL DESIGN FOR IONIZED METAL PLASMA DEPOSITION
(FR) CONFIGURATION D'ENROULEMENT CENTRAL POUR DEPOT EN PHASE VAPEUR ACTIVE PAR PLASMA DE METAL IONISE
Abstract:
(EN) In a plasma generating apparatus, a coil is positioned between a target and a workpiece to inductively couple RF energy into a plasma so that the paths of a portion of the ionized deposition material are deflected from the center of the workpiece and toward the edges of the workpiece. As a consequence, it has been found that the uniformity of deposition may be improved. In the illustrated embodiment, the coil is a multi-turn coil formed in a generally planar spiral centered in the stream of deposition material.
(FR) Dans un appareil générateur de plasma, un enroulement est placé entre une cible et une pièce pour coupler de manière inductive de l'énergie RF dans un plasma, si bien que les voies d'une partie de la matière de dépôt ionisée sont déviées du centre de la pièce vers les bords de cette dernière. Par conséquent, on a trouvé qu'il est possible d'améliorer l'homogénéité de dépôt. Dans le mode de réalisation présenté, l'enroulement est un enroulement à tours multiples formé d'une spirale généralement plane centrée dans le flux de matière de dépôt.
Designated States: JP, KR, SG
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020010012640EP0990251JP2000513881