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1. (WO1998052202) MAGNETOSTATIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME

Pub. No.:    WO/1998/052202    International Application No.:    PCT/JP1998/001176
Publication Date: Fri Nov 20 00:59:59 CET 1998 International Filing Date: Fri Mar 20 00:59:59 CET 1998
IPC: H01F 10/24
H03H 2/00
Applicants: TDK CORPORATION

KURATA, Hitoyoshi

Inventors: KURATA, Hitoyoshi

Title: MAGNETOSTATIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME
Abstract:
At the time of patterning a magnetic garnet film formed on the surface of a nonmagnetic garnet substrate, a magnetic garnet film, an intermediate layer, and a resist layer are successively formed on the surface of the substrate in this order from the substrate side, and the garnet film, the intermediate layer, and the resist layer are etched with a hot phosphoric acid solution after the intermediate and the resist layers are shaped in an island-like form. When the intermediate layer is constituted of a material which is more soluble in the hot phosphoric acid solution than the resist layer, the side faces of the magnetic garnet film become gentle slopes after etching and a conductive pattern can be formed continuously over the surfaces of the nonmagnetic garnet substrate and magnetic garnet film. When a protective layer is formed on the rear surface of the substrate, in addition, the angle of a magnetic field applied to the surface of the magnetic garnet film can be controlled accurately.