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1. (WO1998052083) MECHANISM FOR PLACING OPTICAL LENS BLANK IN HOLDER
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/052083 International Application No.: PCT/JP1998/002179
Publication Date: 19.11.1998 International Filing Date: 18.05.1998
IPC:
G02B 7/02 (2006.01) ,C23C 14/50 (2006.01) ,G02B 1/10 (2015.01) ,G02B 1/11 (2015.01) ,G02B 1/115 (2015.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7
Mountings, adjusting means, or light-tight connections, for optical elements
02
for lenses
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
50
Substrate holders
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
10
Optical coatings produced by application to, or surface treatment of, optical elements
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
10
Optical coatings produced by application to, or surface treatment of, optical elements
11
Anti-reflection coatings
[IPC code unknown for G02B 1/115]
Applicants:
HOYA KABUSHIKI KAISHA [JP/JP]; 7-5, Naka-Ochaiai 2-chome Shinjuku-ku Tokyo 161-8525, JP (AllExceptUS)
KAMURA, Hitoshi [JP/JP]; JP (UsOnly)
YOSHIHARA, Masaaki [JP/JP]; JP (UsOnly)
KAMIYA, Hajime [JP/JP]; JP (UsOnly)
Inventors:
KAMURA, Hitoshi; JP
YOSHIHARA, Masaaki; JP
KAMIYA, Hajime; JP
Agent:
TAMIYA, Hiroshi; 705 Ikebukuro White House Building 20-2, Higashi Ikebukuro 1-chome Toshima-ku Tokyo 170-0013, JP
Priority Data:
9/14317716.05.1997JP
Title (EN) MECHANISM FOR PLACING OPTICAL LENS BLANK IN HOLDER
(FR) MECANISME SERVANT A PLACER UNE EBAUCHE DE LENTILLE OCULAIRE DANS UN SUPPORT
Abstract:
(EN) Antireflection films are formed on both sides of an optical lens by sputtering in a sputtering film forming device. A plurality of optical lens blanks are laid horizontally on a blank holder (26) in a vacuum treatment chamber (22) for sputtering. The blank holder (26) is placed rotatably in a vacuum atmosphere. The optical lens blanks are buried in holes (26a) formed in the blank holder (26) by using annular holding members (52, 152) with their concave surfaces upward. When the edge thickness of the optical lens blank is large, an annular holding member (52) is higher than the edge of the optical lens blank (11) by 2 mm at most. When the edge thickness of the optical lens blank is small, the part of the annular holding member (152) continuous with the upper surface of the optical lens blanks (111) is tapered.
(FR) On crée des pellicules antiréfléchissantes des deux côtés d'une lentille oculaire par pulvérisation dans un dispositif servant à produire une pellicule par pulvérisation. On dispose horizontalement une pluralité d'ébauches de lentilles oculaires sur un support d'ébauches (26) dans une chambre de traitement (22) sous vide afin de les pulvériser. On place le support d'ébauches (26) de façon rotative dans une atmosphère évacuée. On enterre les ébauches de lentilles oculaires dans des orifices (26a) constitués dans le support d'ébauches (26) en utilisant des éléments annulaires de retenue (52, 152) dont les surfaces concaves sont dirigées vers le haut. Quand l'épaisseur de bord de l'ébauche est importante, la hauteur de l'élément annulaire de retenue (52) dépasse de 2 mm maximum le bord de l'ébauche (11) de lentille oculaire. Quand l'épaisseur de bord de l'ébauche est limitée, la partie de l'élément annulaire de retenue (152) continue par rapport à la surface supérieure des ébauches (111) de lentilles oculaires est rétrécie.
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Designated States: AU, CN, JP, KR, US
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020000023797EP0913717US6187159JP3290999CN1226973AU1998072389